{"title":"Alloy Sputtering Targets","description":null,"products":[{"product_id":"aluminum-chromium-al-cr-sputtering-target","title":"Aluminum Chromium (Al\/Cr) Sputtering Target","description":"\u003cp\u003eAluminum Chromium (Al\/Cr) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Cr identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310583355,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-chromium-al-cr-sputtering-target.png?v=1791401872"},{"product_id":"aluminum-chromium-titanium-vanadium-planar-target","title":"Aluminum Chromium Titanium Vanadium Planar Target","description":"\u003cp\u003eAluminum Chromium Titanium Vanadium Planar Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Chromium Titanium Vanadium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310845499,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-chromium-titanium-vanadium-planar-target.png?v=1791401877"},{"product_id":"aluminum-cobalt-al-co-sputtering-target","title":"Aluminum Cobalt (Al\/Co) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Cobalt (Al\/Co) Sputtering Target provides the named material in target form. The Al\/Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310878267,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-cobalt-al-co-sputtering-target.png?v=1791401876"},{"product_id":"aluminum-copper-al-cu-sputtering-target","title":"Aluminum Copper (Al\/Cu) Sputtering Target","description":"\u003cp\u003eAluminum Copper (Al\/Cu) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Cu identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311042107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-al-cu-sputtering-target-basis-rebuilt.png?v=1791401876"},{"product_id":"aluminum-copper-planar-sputtering-target","title":"Aluminum Copper Planar Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Copper Planar Sputtering Target provides the named material in target form. The Aluminum Copper Planar identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311271483,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-planar-sputtering-target-basis-rebuilt.png?v=1791401877"},{"product_id":"aluminum-copper-silicon-al-cu-si-sputtering-target","title":"Aluminum Copper Silicon (Al\/Cu\/Si) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Copper Silicon (Al\/Cu\/Si) Sputtering Target provides the named material in target form. The Al\/Cu\/Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311304251,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-silicon-al-cu-si-sputtering-target-basis-rebuilt.png?v=1791401878"},{"product_id":"aluminum-lithium-al-li-sputtering-target","title":"Aluminum Lithium (Al\/Li) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Lithium (Al\/Li) Sputtering Target provides the named material in target form. The Al\/Li identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311763003,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-lithium-al-li-sputtering-target-basis-rebuilt.png?v=1791401880"},{"product_id":"aluminum-magnesium-al-mg-sputtering-target","title":"Aluminum Magnesium (Al\/Mg) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Magnesium (Al\/Mg) Sputtering Target provides the named material in target form. The Al\/Mg identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311894075,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-magnesium-al-mg-sputtering-target.png?v=1791401880"},{"product_id":"aluminum-manganese-sputtering-target","title":"Aluminum Manganese Sputtering Target","description":"\u003cp\u003eAluminum Manganese Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Manganese identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311992379,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-manganese-sputtering-target-basis-rebuilt.png?v=1791401882"},{"product_id":"aluminum-neodymium-sputtering-target","title":"Aluminum Neodymium Sputtering Target","description":"\u003cp\u003eAluminum Neodymium Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Neodymium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312090683,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-neodymium-sputtering-target-basis-rebuilt.png?v=1791401883"},{"product_id":"aluminum-nickel-al-ni-sputtering-target","title":"Aluminum Nickel (Al\/Ni) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Nickel (Al\/Ni) Sputtering Target provides the named material in target form. The Al\/Ni identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312188987,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nickel-al-ni-sputtering-target.png?v=1791401884"},{"product_id":"aluminum-nickel-planar-target","title":"Aluminum Nickel Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Nickel Planar Target provides the named material in target form. The Aluminum Nickel identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312418363,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nickel-planar-target.png?v=1791401885"},{"product_id":"aluminum-silicon-al-si-sputtering-target","title":"Aluminum Silicon (Al\/Si) Sputtering Target","description":"\u003cp\u003eAluminum Silicon (Al\/Si) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321790011,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-al-si-sputtering-target-basis-rebuilt.png?v=1791401890"},{"product_id":"aluminum-silicon-copper-al-si-cu-sputtering-target","title":"Aluminum Silicon Copper (Al\/Si\/Cu) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Silicon Copper (Al\/Si\/Cu) Sputtering Target provides the named material in target form. The Al\/Si\/Cu identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321921083,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-copper-al-si-cu-sputtering-target-basis-rebuilt.png?v=1791401892"},{"product_id":"aluminum-silicon-planar-target","title":"Aluminum Silicon Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Silicon Planar Target provides the named material in target form. The Aluminum Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321986619,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-planar-target-basis-rebuilt.png?v=1791401891"},{"product_id":"aluminum-tin-copper-planar-target","title":"Aluminum Tin Copper Planar Target","description":"\u003cp\u003eAluminum Tin Copper Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Tin Copper identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322248763,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-planar-target-basis-rebuilt.png?v=1791401893"},{"product_id":"aluminum-tin-copper-rotary-sputtering-target","title":"Aluminum Tin Copper Rotary Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Tin Copper Rotary Sputtering Target provides the named material in target form. The Aluminum Tin Copper Rotary identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322641979,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-rotary-sputtering-target-basis-rebuilt.png?v=1791401895"},{"product_id":"aluminum-tin-copper-target","title":"Aluminum Tin Copper Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Tin Copper Target provides the named material in target form. The Aluminum Tin Copper Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322707515,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-target-basis-rebuilt.png?v=1791401895"},{"product_id":"aluminum-titanium-al-ti-sputtering-target","title":"Aluminum Titanium (Al\/Ti) Sputtering Target","description":"\u003cp\u003eAluminum Titanium (Al\/Ti) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Ti identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322838587,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-titanium-al-ti-sputtering-target.png?v=1791401897"},{"product_id":"aluminum-titanium-silicon-planar-target","title":"Aluminum Titanium Silicon Planar Target","description":"\u003cp\u003eAluminum Titanium Silicon Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Titanium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322904123,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-titanium-silicon-planar-target-basis-rebuilt.png?v=1791401897"},{"product_id":"aluminum-zinc-indium-silicon-planar-target","title":"Aluminum Zinc Indium Silicon Planar Target","description":"\u003cp\u003eAluminum Zinc Indium Silicon Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Zinc Indium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323002427,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-zinc-indium-silicon-planar-target-basis-rebuilt.png?v=1791401898"},{"product_id":"antimony-indium-tin-sb-in-sn-sputtering-target","title":"Antimony Indium Tin (Sb\/In\/Sn) Sputtering Target","description":"\u003cp\u003eAntimony Indium Tin (Sb\/In\/Sn) Sputtering Target is a source material for physical vapor deposition by sputtering. The Sb\/In\/Sn identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323166267,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-indium-tin-sb-in-sn-sputtering-target-basis-rebuilt.png?v=1791401900"},{"product_id":"barium-aluminum-alloy-target","title":"Barium Aluminum Alloy Target","description":"\u003cp\u003eBarium Aluminum Alloy Target brings the specified material system into a sputtering source for thin-film deposition. The Barium Aluminum Alloy Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323788859,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-aluminum-alloy-target-basis-rebuilt.png?v=1791401907"},{"product_id":"bismuth-antimony-bi-sb-sputtering-target","title":"Bismuth Antimony (Bi\/Sb) Sputtering Target","description":"\u003cp\u003eBismuth Antimony (Bi\/Sb) Sputtering Target is a source material for physical vapor deposition by sputtering. The Bi\/Sb identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325361723,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-antimony-bi-sb-sputtering-target-basis-rebuilt.png?v=1791401917"},{"product_id":"cerium-magnesium-planar-target","title":"Cerium Magnesium Planar Target","description":"\u003cp\u003eCerium Magnesium Planar Target brings the specified material system into a sputtering source for thin-film deposition. The Cerium Magnesium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330014779,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cerium-magnesium-planar-target-basis-rebuilt.png?v=1791401949"},{"product_id":"chromium-cobalt-cr-co-sputtering-target","title":"Chromium Cobalt (Cr\/Co) Sputtering Target","description":"\u003cp\u003eChromium Cobalt (Cr\/Co) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Cr\/Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330965051,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-cobalt-cr-co-sputtering-target.png?v=1791401957"},{"product_id":"chromium-copper-cr-cu-sputtering-target","title":"Chromium Copper (Cr\/Cu) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Chromium Copper (Cr\/Cu) Sputtering Target provides the named material in target form. The Cr\/Cu identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331063355,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-copper-cr-cu-sputtering-target-basis-rebuilt.png?v=1791401960"},{"product_id":"chromium-molybdenum-cr-mo-sputtering-target","title":"Chromium Molybdenum (Cr\/Mo) Sputtering Target","description":"\u003cp\u003eChromium Molybdenum (Cr\/Mo) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Cr\/Mo identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331161659,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-molybdenum-cr-mo-sputtering-target.png?v=1791401961"},{"product_id":"chromium-nickel-cr-ni-sputtering-target","title":"Chromium Nickel (Cr\/Ni) Sputtering Target","description":"\u003cp\u003eChromium Nickel (Cr\/Ni) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Cr\/Ni identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331391035,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-nickel-cr-ni-sputtering-target.png?v=1791401962"},{"product_id":"chromium-silicon-aluminum-target","title":"Chromium Silicon Aluminum Target","description":"\u003cp\u003eChromium Silicon Aluminum Target is a source material for physical vapor deposition by sputtering. The Chromium Silicon Aluminum Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331915323,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-silicon-aluminum-target-basis-rebuilt.png?v=1791401968"},{"product_id":"chromium-titanium-cr-ti-sputtering-target","title":"Chromium Titanium (Cr\/Ti) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Chromium Titanium (Cr\/Ti) Sputtering Target provides the named material in target form. The Cr\/Ti identity helps define the film chemistry under a specified deposition process. 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