{"title":"Ceramic \u0026 Compound Sputtering Targets","description":null,"products":[{"product_id":"aluminum-antimonide-sputtering-target","title":"Aluminum Antimonide Sputtering Target","description":"\u003cp\u003eAluminum Antimonide Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Antimonide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310648891,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-antimonide-sputtering-target-basis-rebuilt.png?v=1791401872"},{"product_id":"aluminum-boride-alb2-sputtering-target","title":"Aluminum Boride (AlB2) Sputtering Target","description":"\u003cp\u003eAluminum Boride (AlB2) Sputtering Target is a source material for physical vapor deposition by sputtering. The AlB2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310779963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-boride-alb2-sputtering-target-basis-rebuilt.png?v=1791401874"},{"product_id":"aluminum-fluoride-alf3-sputtering-target","title":"Aluminum Fluoride (AlF3) Sputtering Target","description":"\u003cp\u003eAluminum Fluoride (AlF3) Sputtering Target is a source material for physical vapor deposition by sputtering. The AlF3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311730235,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-fluoride-alf3-sputtering-target-basis-rebuilt.png?v=1791401879"},{"product_id":"aluminum-gallium-antimonide-target","title":"Aluminum Gallium Antimonide Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Gallium Antimonide Target provides the named material in target form. The Aluminum Gallium Antimonide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311828539,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-gallium-antimonide-target-basis-rebuilt.png?v=1791401880"},{"product_id":"aluminum-oxide-al2o3-sputtering-target","title":"Aluminum Oxide (Al2O3) Sputtering Target","description":"\u003cp\u003eAluminum Oxide (Al2O3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum oxide is an electrically insulating ceramic. It may be specified for dielectric and protective coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312778811,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-al2o3-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-nitride-aln-sputtering-target","title":"Aluminum Nitride (AlN) Sputtering Target","description":"\u003cp\u003eAluminum Nitride (AlN) Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum nitride is a ceramic valued for thermal conductivity and electrical insulation. Common areas of inquiry include electronic and functional-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400314449979,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nitride-aln-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-oxide-planar-sputtering-target","title":"Aluminum Oxide Planar Sputtering Target","description":"\u003cp\u003eAluminum Oxide Planar Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum oxide is an electrically insulating ceramic. Common areas of inquiry include dielectric and protective coating research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400314581051,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-planar-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-selenide-sputtering-target","title":"Aluminum Selenide Sputtering Target","description":"\u003cp\u003eAluminum Selenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Selenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321658939,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-selenide-sputtering-target-basis-rebuilt.png?v=1791401889"},{"product_id":"aluminum-telluride-alte-sputtering-target","title":"Aluminum Telluride (AlTe) Sputtering Target","description":"\u003cp\u003eAluminum Telluride (AlTe) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The AlTe identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322117691,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-telluride-alte-sputtering-target-basis-rebuilt.png?v=1791401892"},{"product_id":"aluminum-doped-lithium-manganese-oxide-target","title":"Aluminum-doped Lithium Manganese Oxide Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum-doped Lithium Manganese Oxide Target provides the named material in target form. The Aluminum-doped Lithium Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323067963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-lithium-manganese-oxide-target-basis-rebuilt.png?v=1791401899"},{"product_id":"aluminum-doped-zinc-oxide-azo-sputtering-target","title":"Aluminum-doped Zinc Oxide (AZO) Sputtering Target","description":"\u003cp\u003eAluminum-doped Zinc Oxide (AZO) Sputtering Target is a source material for physical vapor deposition by sputtering. The AZO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323100731,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-zinc-oxide-azo-sputtering-target-basis-rebuilt.png?v=1791401900"},{"product_id":"antimony-sulfide-sb2s3-sputtering-target","title":"Antimony Sulfide (Sb2S3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Antimony Sulfide (Sb2S3) Sputtering Target provides the named material in target form. The Sb2S3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323231803,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-sulfide-sb2s3-sputtering-target-basis-six-hole-copper-backing-2026-10-07.png?v=1791430471"},{"product_id":"antimony-telluride-sb2te3-sputtering-target","title":"Antimony Telluride (Sb2Te3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Antimony Telluride (Sb2Te3) Sputtering Target provides the named material in target form. The Sb2Te3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323264571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-telluride-sb2te3-sputtering-target-basis-rebuilt.png?v=1791401902"},{"product_id":"antimony-triselenide-sputtering-target","title":"Antimony Triselenide Sputtering Target","description":"\u003cp\u003eAntimony Triselenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Antimony Triselenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323330107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-triselenide-sputtering-target-basis-rebuilt.png?v=1791401903"},{"product_id":"antimony-doped-tin-oxide-ato-sputtering-target","title":"Antimony-Doped Tin Oxide (ATO) Sputtering Target","description":"\u003cp\u003eAntimony-Doped Tin Oxide (ATO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The ATO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323395643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-doped-tin-oxide-ato-sputtering-target-basis-rebuilt.png?v=1791401904"},{"product_id":"arsenic-triselenide-sputtering-target","title":"Arsenic Triselenide Sputtering Target","description":"\u003cp\u003eArsenic Triselenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Arsenic Triselenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323461179,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/arsenic-triselenide-sputtering-target-basis-rebuilt.png?v=1791401904"},{"product_id":"arsenic-trisulfide-as2s3-sputtering-target","title":"Arsenic Trisulfide (As2S3) Sputtering Target","description":"\u003cp\u003eArsenic Trisulfide (As2S3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The As2S3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323526715,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/arsenic-trisulfide-as2s3-sputtering-target-basis-rebuilt.png?v=1791401905"},{"product_id":"barium-carbonate-sputtering-target","title":"Barium Carbonate Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Carbonate Sputtering Target provides the named material in target form. The Barium Carbonate identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324018235,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-carbonate-sputtering-target-basis-rebuilt.png?v=1791401907"},{"product_id":"barium-cerium-oxide-baceo3-sputtering-target","title":"Barium Cerium Oxide (BaCeO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Cerium Oxide (BaCeO3) Sputtering Target provides the named material in target form. The BaCeO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324214843,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-cerium-oxide-baceo3-sputtering-target-basis-rebuilt.png?v=1791401908"},{"product_id":"barium-ferrite-bafe12o19-sputtering-target","title":"Barium Ferrite (BaFe12O19) Sputtering Target","description":"\u003cp\u003eBarium Ferrite (BaFe12O19) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The BaFe12O19 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324247611,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-ferrite-bafe12o19-sputtering-target-basis-rebuilt.png?v=1791401910"},{"product_id":"barium-fluoride-baf2-sputtering-target","title":"Barium Fluoride (BaF2) Sputtering Target","description":"\u003cp\u003eBarium Fluoride (BaF2) Sputtering Target is a source material for physical vapor deposition by sputtering. The BaF2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324313147,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-fluoride-baf2-sputtering-target-basis-rebuilt.png?v=1791401910"},{"product_id":"barium-niobate-banbo3-sputtering-target","title":"Barium Niobate (BaNbO3) Sputtering Target","description":"\u003cp\u003eBarium Niobate (BaNbO3) Sputtering Target is a source material for physical vapor deposition by sputtering. The BaNbO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324444219,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-niobate-banbo3-sputtering-target-basis-rebuilt.png?v=1791401910"},{"product_id":"barium-oxide-sputtering-target","title":"Barium Oxide Sputtering Target","description":"\u003cp\u003eBarium Oxide Sputtering Target is a source material for physical vapor deposition by sputtering. The Barium Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324673595,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-oxide-sputtering-target-basis-rebuilt.png?v=1791401912"},{"product_id":"barium-strontium-titanate-ba0-5sr0-5tio3-sputtering-target","title":"Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target","description":"\u003cp\u003eBarium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Ba0.5Sr0.5TiO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324706363,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-strontium-titanate-ba0-5sr0-5tio3-sputtering-target-basis-rebuilt.png?v=1791401912"},{"product_id":"barium-strontium-titanate-sputtering-target","title":"Barium Strontium Titanate Sputtering Target","description":"\u003cp\u003eBarium Strontium Titanate Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Barium Strontium Titanate identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324771899,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-strontium-titanate-sputtering-target-basis-rebuilt.png?v=1791401913"},{"product_id":"barium-strontium-titanate-target","title":"Barium Strontium Titanate Target","description":"\u003cp\u003eBarium Strontium Titanate Target is a source material for physical vapor deposition by sputtering. The Barium Strontium Titanate Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324804667,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-strontium-titanate-target-basis-rebuilt.png?v=1791401913"},{"product_id":"barium-sulfide-bas-sputtering-target","title":"Barium Sulfide (BaS) Sputtering Target","description":"\u003cp\u003eBarium Sulfide (BaS) Sputtering Target is a source material for physical vapor deposition by sputtering. The BaS identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324870203,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-sulfide-bas-sputtering-target-basis-rebuilt.png?v=1791401915"},{"product_id":"barium-titanate-batio3-sputtering-target","title":"Barium Titanate (BaTiO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Titanate (BaTiO3) Sputtering Target provides the named material in target form. The Barium Titanate (BaTiO3) identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324902971,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-titanate-batio3-sputtering-target-basis-rebuilt.png?v=1791401915"},{"product_id":"barium-zirconate-bazro3-sputtering-target","title":"Barium Zirconate (BaZrO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Zirconate (BaZrO3) Sputtering Target provides the named material in target form. The BaZrO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325296187,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-zirconate-bazro3-sputtering-target-basis-rebuilt.png?v=1791401916"},{"product_id":"bismuth-antimony-selenide-bi-sb-se-sputtering-target","title":"Bismuth Antimony Selenide (Bi\/Sb\/Se) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Bismuth Antimony Selenide (Bi\/Sb\/Se) Sputtering Target provides the named material in target form. The Bi\/Sb\/Se identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325394491,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-antimony-selenide-bi-sb-se-sputtering-target-basis-rebuilt.png?v=1791401918"},{"product_id":"bismuth-antimony-telluride-bi-sb-te-sputtering-targets","title":"Bismuth Antimony Telluride (Bi\/Sb\/Te) Sputtering Targets","description":"\u003cp\u003eBismuth Antimony Telluride (Bi\/Sb\/Te) Sputtering Targets is a source material for physical vapor deposition by sputtering. The Bi\/Sb\/Te identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325427259,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-antimony-telluride-bi-sb-te-sputtering-targets-basis-rebuilt.png?v=1791401919"},{"product_id":"bismuth-calcium-ferrite-sputtering-target","title":"Bismuth Calcium Ferrite Sputtering Target","description":"\u003cp\u003eBismuth Calcium Ferrite Sputtering Target is a source material for physical vapor deposition by sputtering. The Bismuth Calcium Ferrite identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325492795,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-calcium-ferrite-sputtering-target-basis-rebuilt.png?v=1791401920"},{"product_id":"bismuth-ferrite-bifeo3-sputtering-target","title":"Bismuth Ferrite (BiFeO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Bismuth Ferrite (BiFeO3) Sputtering Target provides the named material in target form. The BiFeO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325525563,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-ferrite-bifeo3-sputtering-target-basis-rebuilt.png?v=1791401920"},{"product_id":"bismuth-iron-oxide-bi3fe5o12-sputtering-target","title":"Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target","description":"\u003cp\u003eBismuth Iron Oxide (Bi3Fe5O12) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Bi3Fe5O12 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325787707,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-iron-oxide-bi3fe5o12-sputtering-target-basis-rebuilt.png?v=1791401921"},{"product_id":"bismuth-lanthanum-ferrite-bi-1-x-laxfeo3-sputtering-target","title":"Bismuth Lanthanum Ferrite (Bi(1-x)LaxFeO3) Sputtering Target","description":"\u003cp\u003eBismuth Lanthanum Ferrite (Bi(1-x)LaxFeO3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Bismuth Lanthanum Ferrite (Bi(1-x)LaxFeO3) identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325853243,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-lanthanum-ferrite-bi-1-x-laxfeo3-sputtering-target-basis-rebuilt.png?v=1791401922"},{"product_id":"bismuth-manganate-bi2-4mno3-sputtering-target","title":"Bismuth Manganate (Bi2.4MnO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Bismuth Manganate (Bi2.4MnO3) Sputtering Target provides the named material in target form. The Bi2.4MnO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325886011,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-manganate-bi2-4mno3-sputtering-target-basis-rebuilt.png?v=1791401923"},{"product_id":"bismuth-oxide-bi2o3-sputtering-target","title":"Bismuth Oxide (Bi2O3) Sputtering Target","description":"\u003cp\u003eBismuth Oxide (Bi2O3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Bi2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325951547,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-oxide-bi2o3-sputtering-target-basis-rebuilt.png?v=1791401926"},{"product_id":"bismuth-selenide-bi2se3-sputtering-target","title":"Bismuth Selenide (Bi2Se3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Bismuth Selenide (Bi2Se3) Sputtering Target provides the named material in target form. The Bi2Se3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326344763,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-selenide-bi2se3-sputtering-target-basis-rebuilt.png?v=1791401924"},{"product_id":"bismuth-sulfide-bi2s3-sputtering-target","title":"Bismuth Sulfide (Bi2S3) Sputtering Target","description":"\u003cp\u003eBismuth Sulfide (Bi2S3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Bi2S3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326377531,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-sulfide-bi2s3-sputtering-target-basis-rebuilt.png?v=1791401925"},{"product_id":"bismuth-telluride-bi2te3-sputtering-target","title":"Bismuth Telluride (Bi2Te3) Sputtering Target","description":"\u003cp\u003eBismuth Telluride (Bi2Te3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Bi2Te3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326443067,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-telluride-bi2te3-sputtering-target-basis-rebuilt.png?v=1791401926"},{"product_id":"bismuth-titanate-bi4ti3o12-sputtering-target","title":"Bismuth Titanate (Bi4Ti3O12) Sputtering Target","description":"\u003cp\u003eBismuth Titanate (Bi4Ti3O12) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Bi4Ti3O12 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326508603,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-titanate-bi4ti3o12-sputtering-target-basis-rebuilt.png?v=1791401927"},{"product_id":"bismuth-vanadate-sputtering-targets","title":"Bismuth Vanadate Sputtering Targets","description":"\u003cp\u003eFor sputtered thin-film work, Bismuth Vanadate Sputtering Targets provides the named material in target form. The Bismuth Vanadate identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326541371,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-vanadate-sputtering-targets-basis-rebuilt.png?v=1791401927"},{"product_id":"black-iron-oxide-fe3o4-sputtering-target","title":"Black Iron Oxide (Fe3O4) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Black Iron Oxide (Fe3O4) Sputtering Target provides the named material in target form. Magnetite is an iron oxide with magnetic behavior. Researchers may consider this material for magnetic oxide film research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326606907,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/black-iron-oxide-fe3o4-sputtering-target-basis-rebuilt.png?v=1791401928"},{"product_id":"boron-carbide-b4c-sputtering-target","title":"Boron Carbide (B4C) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Boron Carbide (B4C) Sputtering Target provides the named material in target form. Boron carbide is a hard ceramic compound. Researchers may consider this material for protective coating and ceramic-film research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326705211,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/boron-carbide-b4c-sputtering-target-basis-rebuilt.png?v=1791401930"},{"product_id":"boron-nitride-bn-sputtering-target","title":"Boron Nitride (BN) Sputtering Target","description":"\u003cp\u003eBoron Nitride (BN) Sputtering Target is a source material for physical vapor deposition by sputtering. Boron nitride is a ceramic compound used in insulating and protective material systems. Common areas of inquiry include ceramic-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326770747,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/boron-nitride-bn-sputtering-target-basis-rebuilt.png?v=1791401931"},{"product_id":"boron-oxide-doped-lithium-phosphate-target","title":"Boron Oxide-doped Lithium Phosphate Target","description":"\u003cp\u003eBoron Oxide-doped Lithium Phosphate Target brings the specified material system into a sputtering source for thin-film deposition. The Boron Oxide-doped Lithium Phosphate Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327163963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/boron-oxide-doped-lithium-phosphate-target-basis-rebuilt.png?v=1791401933"},{"product_id":"ca3mn2o7-target","title":"Ca3Mn2O7 Target","description":"\u003cp\u003eCa3Mn2O7 Target is a source material for physical vapor deposition by sputtering. The Ca3Mn2O7 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327196731,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/ca3mn2o7-target-basis-rebuilt.png?v=1791401933"},{"product_id":"cadmium-arsenide-sputtering-target","title":"Cadmium Arsenide Sputtering Target","description":"\u003cp\u003eCadmium Arsenide Sputtering Target is a source material for physical vapor deposition by sputtering. The Cadmium Arsenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327360571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cadmium-arsenide-sputtering-target-basis-rebuilt.png?v=1791401934"},{"product_id":"cadmium-fluoride-cdf2-sputtering-target","title":"Cadmium Fluoride (CdF2) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cadmium Fluoride (CdF2) Sputtering Target provides the named material in target form. The CdF2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327458875,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cadmium-fluoride-cdf2-sputtering-target-basis-rebuilt.png?v=1791401936"},{"product_id":"cadmium-oxide-cdo-sputtering-target","title":"Cadmium Oxide (CdO) Sputtering Target","description":"\u003cp\u003eCadmium Oxide (CdO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The CdO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327491643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cadmium-oxide-cdo-sputtering-target-basis-rebuilt.png?v=1791401936"}],"url":"https:\/\/basismaterials.com\/collections\/ceramic-compound-sputtering-targets.oembed?page=7","provider":"Basis Materials","version":"1.0","type":"link"}