{"title":"High-Entropy Alloy Sputtering Targets","description":null,"products":[{"product_id":"chromium-cobalt-nickel-high-entropy-alloy-hea-sputtering-target","title":"Chromium Cobalt Nickel High-Entropy Alloy (HEA) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Chromium Cobalt Nickel High-Entropy Alloy (HEA) Sputtering Target provides the named material in target form. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Researchers may consider this material for multi-principal-element materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330997819,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-cobalt-nickel-high-entropy-alloy-hea-sputtering-target.png?v=1791401958"},{"product_id":"cocrfeni-high-entropy-alloy-sputtering-target","title":"CoCrFeNi High Entropy Alloy Sputtering Target","description":"\u003cp\u003eCoCrFeNi High Entropy Alloy Sputtering Target is a source material for physical vapor deposition by sputtering. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Common areas of inquiry include multi-principal-element materials research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400332734523,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cocrfeni-high-entropy-alloy-sputtering-target.png?v=1791401972"},{"product_id":"cocrfenial-high-entropy-alloy-sputtering-target","title":"CoCrFeNiAl High Entropy Alloy Sputtering Target","description":"\u003cp\u003eCoCrFeNiAl High Entropy Alloy Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. It may be specified for multi-principal-element materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400332767291,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cocrfenial-high-entropy-alloy-sputtering-target.png?v=1791401974"},{"product_id":"cobalt-chromium-iron-nickel-aluminum-high-entropy-alloy-hea-sputtering-target","title":"Cobalt Chromium Iron Nickel Aluminum High-Entropy Alloy (HEA) Sputtering Target","description":"\u003cp\u003eCobalt Chromium Iron Nickel Aluminum High-Entropy Alloy (HEA) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. It may be specified for multi-principal-element materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400333553723,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-chromium-iron-nickel-aluminum-high-entropy-alloy-hea-sputtering-target.png?v=1791401979"},{"product_id":"cobalt-chromium-iron-nickel-manganese-high-entropy-alloy-hea-sputtering-target","title":"Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target provides the named material in target form. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Researchers may consider this material for multi-principal-element materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400333652027,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-chromium-iron-nickel-manganese-high-entropy-alloy-hea-sputtering-target-basis-rebuilt.png?v=1791401978"},{"product_id":"cobalt-nickel-vanadium-high-entropy-alloy-hea-sputtering-target","title":"Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target provides the named material in target form. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Researchers may consider this material for multi-principal-element materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400334766139,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-nickel-vanadium-high-entropy-alloy-hea-sputtering-target.png?v=1791401985"}],"url":"https:\/\/basismaterials.com\/collections\/high-entropy-alloy-sputtering-targets.oembed","provider":"Basis Materials","version":"1.0","type":"link"}