{"title":"Oxide Sputtering Targets","description":null,"products":[{"product_id":"aluminum-oxide-al2o3-sputtering-target","title":"Aluminum Oxide (Al2O3) Sputtering Target","description":"\u003cp\u003eAluminum Oxide (Al2O3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum oxide is an electrically insulating ceramic. It may be specified for dielectric and protective coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312778811,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-al2o3-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-oxide-planar-sputtering-target","title":"Aluminum Oxide Planar Sputtering Target","description":"\u003cp\u003eAluminum Oxide Planar Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum oxide is an electrically insulating ceramic. Common areas of inquiry include dielectric and protective coating research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400314581051,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-planar-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-doped-lithium-manganese-oxide-target","title":"Aluminum-doped Lithium Manganese Oxide Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum-doped Lithium Manganese Oxide Target provides the named material in target form. The Aluminum-doped Lithium Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323067963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-lithium-manganese-oxide-target-basis-rebuilt.png?v=1791401899"},{"product_id":"aluminum-doped-zinc-oxide-azo-sputtering-target","title":"Aluminum-doped Zinc Oxide (AZO) Sputtering Target","description":"\u003cp\u003eAluminum-doped Zinc Oxide (AZO) Sputtering Target is a source material for physical vapor deposition by sputtering. The AZO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323100731,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-zinc-oxide-azo-sputtering-target-basis-rebuilt.png?v=1791401900"},{"product_id":"antimony-doped-tin-oxide-ato-sputtering-target","title":"Antimony-Doped Tin Oxide (ATO) Sputtering Target","description":"\u003cp\u003eAntimony-Doped Tin Oxide (ATO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The ATO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323395643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-doped-tin-oxide-ato-sputtering-target-basis-rebuilt.png?v=1791401904"},{"product_id":"barium-cerium-oxide-baceo3-sputtering-target","title":"Barium Cerium Oxide (BaCeO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Cerium Oxide (BaCeO3) Sputtering Target provides the named material in target form. The BaCeO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324214843,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-cerium-oxide-baceo3-sputtering-target-basis-rebuilt.png?v=1791401908"},{"product_id":"barium-oxide-sputtering-target","title":"Barium Oxide Sputtering Target","description":"\u003cp\u003eBarium Oxide Sputtering Target is a source material for physical vapor deposition by sputtering. The Barium Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324673595,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-oxide-sputtering-target-basis-rebuilt.png?v=1791401912"},{"product_id":"bismuth-iron-oxide-bi3fe5o12-sputtering-target","title":"Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target","description":"\u003cp\u003eBismuth Iron Oxide (Bi3Fe5O12) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Bi3Fe5O12 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325787707,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-iron-oxide-bi3fe5o12-sputtering-target-basis-rebuilt.png?v=1791401921"},{"product_id":"bismuth-oxide-bi2o3-sputtering-target","title":"Bismuth Oxide (Bi2O3) Sputtering Target","description":"\u003cp\u003eBismuth Oxide (Bi2O3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Bi2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400325951547,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/bismuth-oxide-bi2o3-sputtering-target-basis-rebuilt.png?v=1791401926"},{"product_id":"black-iron-oxide-fe3o4-sputtering-target","title":"Black Iron Oxide (Fe3O4) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Black Iron Oxide (Fe3O4) Sputtering Target provides the named material in target form. Magnetite is an iron oxide with magnetic behavior. Researchers may consider this material for magnetic oxide film research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326606907,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/black-iron-oxide-fe3o4-sputtering-target-basis-rebuilt.png?v=1791401928"},{"product_id":"boron-oxide-doped-lithium-phosphate-target","title":"Boron Oxide-doped Lithium Phosphate Target","description":"\u003cp\u003eBoron Oxide-doped Lithium Phosphate Target brings the specified material system into a sputtering source for thin-film deposition. The Boron Oxide-doped Lithium Phosphate Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327163963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/boron-oxide-doped-lithium-phosphate-target-basis-rebuilt.png?v=1791401933"},{"product_id":"cadmium-oxide-cdo-sputtering-target","title":"Cadmium Oxide (CdO) Sputtering Target","description":"\u003cp\u003eCadmium Oxide (CdO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The CdO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327491643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cadmium-oxide-cdo-sputtering-target-basis-rebuilt.png?v=1791401936"},{"product_id":"calcium-oxide-cao-sputtering-target","title":"Calcium Oxide (CaO) Sputtering Target","description":"\u003cp\u003eCalcium Oxide (CaO) Sputtering Target is a source material for physical vapor deposition by sputtering. The CaO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400328081467,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/calcium-oxide-cao-sputtering-target-basis-rebuilt.png?v=1791401942"},{"product_id":"cerium-oxide-ceo2-sputtering-target","title":"Cerium Oxide (CeO2) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cerium Oxide (CeO2) Sputtering Target provides the named material in target form. The CeO2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330047547,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cerium-oxide-ceo2-sputtering-target-basis-rebuilt.png?v=1791401950"},{"product_id":"chromium-oxide-cr2o3-sputtering-target","title":"Chromium Oxide (Cr2O3) Sputtering Target","description":"\u003cp\u003eChromium Oxide (Cr2O3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Cr2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331456571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-oxide-cr2o3-sputtering-target-basis-rebuilt.png?v=1791401963"},{"product_id":"chromium-trioxide-cro3-sputtering-target","title":"Chromium Trioxide (CrO3) Sputtering Target","description":"\u003cp\u003eChromium Trioxide (CrO3) Sputtering Target is a source material for physical vapor deposition by sputtering. The CrO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400332243003,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-trioxide-cro3-sputtering-target-basis-rebuilt.png?v=1791401971"},{"product_id":"chromium-doped-silicon-monoxide-sio-cr-sputtering-target","title":"Chromium-doped Silicon Monoxide (SiO\/Cr) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Chromium-doped Silicon Monoxide (SiO\/Cr) Sputtering Target provides the named material in target form. The SiO\/Cr identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400332701755,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-doped-silicon-monoxide-sio-cr-sputtering-target-basis-rebuilt.png?v=1791401972"},{"product_id":"cobalt-oxide-coo-sputtering-target","title":"Cobalt Oxide (CoO) Sputtering Target","description":"\u003cp\u003eCobalt Oxide (CoO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The CoO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400334798907,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-oxide-coo-sputtering-target-basis-rebuilt.png?v=1791401987"},{"product_id":"cobalt-oxide-sputtering-targets","title":"Cobalt Oxide Sputtering Targets","description":"\u003cp\u003eCobalt Oxide Sputtering Targets brings the specified material system into a sputtering source for thin-film deposition. The Cobalt Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400334897211,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-oxide-sputtering-targets-basis-rebuilt.png?v=1791401988"},{"product_id":"copper-aluminum-oxide-cualo2-sputtering-target","title":"Copper Aluminum Oxide (CuAlO2) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Copper Aluminum Oxide (CuAlO2) Sputtering Target provides the named material in target form. Aluminum oxide is an electrically insulating ceramic. Researchers may consider this material for dielectric and protective coating research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400335552571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-aluminum-oxide-cualo2-sputtering-target-basis-rebuilt.png?v=1791401995"},{"product_id":"copper-oxide-cuo-sputtering-target","title":"Copper Oxide (CuO) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Copper Oxide (CuO) Sputtering Target provides the named material in target form. The CuO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400337420347,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-oxide-cuo-sputtering-target-basis-rebuilt.png?v=1791402012"},{"product_id":"copper-i-oxide-sputtering-targets","title":"Copper(I) Oxide Sputtering Targets","description":"\u003cp\u003eCopper(I) Oxide Sputtering Targets brings the specified material system into a sputtering source for thin-film deposition. The Copper(I) Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400338403387,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-i-oxide-sputtering-targets-basis-rebuilt.png?v=1791402021"},{"product_id":"fluorine-doped-tin-oxide-fto-sputtering-target","title":"Fluorine Doped Tin Oxide FTO Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Fluorine Doped Tin Oxide FTO Sputtering Target provides the named material in target form. The FTO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400338567227,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/fluorine-doped-tin-oxide-fto-sputtering-target-basis-rebuilt.png?v=1791402024"},{"product_id":"indium-aluminum-zinc-oxide-in2o3-al2o3-zno-65-16-19-wt-sputtering-target","title":"Indium Aluminum Zinc Oxide (In2O3\/Al2O3\/ZnO) 65\/16\/19 wt% Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Indium Aluminum Zinc Oxide (In2O3\/Al2O3\/ZnO) 65\/16\/19 wt% Sputtering Target provides the named material in target form. Aluminum oxide is an electrically insulating ceramic. Researchers may consider this material for dielectric and protective coating research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400341745723,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-aluminum-zinc-oxide-in2o3-al2o3-zno-65-16-19-wt-sputtering-target-basis-rebuilt.png?v=1791402048"},{"product_id":"indium-gallium-oxide-igo-sputtering-target","title":"Indium Gallium Oxide (IGO) Sputtering Target","description":"\u003cp\u003eIndium Gallium Oxide (IGO) Sputtering Target is a source material for physical vapor deposition by sputtering. The Indium Gallium Oxide (IGO) identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400342270011,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-gallium-oxide-igo-sputtering-target-basis-rebuilt.png?v=1791402050"},{"product_id":"indium-gallium-zinc-oxide-igzo-sputtering-target","title":"Indium Gallium Zinc Oxide (IGZO) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Indium Gallium Zinc Oxide (IGZO) Sputtering Target provides the named material in target form. The IGZO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400342302779,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-gallium-zinc-oxide-igzo-sputtering-target-basis-rebuilt.png?v=1791402051"},{"product_id":"indium-iron-oxide-infe2o4-sputtering-target","title":"Indium Iron Oxide (InFe2O4) Sputtering Target","description":"\u003cp\u003eIndium Iron Oxide (InFe2O4) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The InFe2O4 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400342368315,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-iron-oxide-infe2o4-sputtering-target-basis-rebuilt.png?v=1791402051"},{"product_id":"indium-oxide-sputtering-target","title":"Indium Oxide Sputtering Target","description":"\u003cp\u003eIndium Oxide Sputtering Target is a source material for physical vapor deposition by sputtering. The Indium Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400342630459,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-oxide-sputtering-target-flat-face-2026-10-07.png?v=1791429613"},{"product_id":"indium-molybdenum-oxide-in2o3-mo-98-2-wt-sputtering-target","title":"Indium Molybdenum Oxide (In2O3\/Mo) 98\/2 wt% Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Indium Molybdenum Oxide (In2O3\/Mo) 98\/2 wt% Sputtering Target provides the named material in target form. The In2O3\/Mo identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400342663227,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-molybdenum-oxide-in2o3-mo-98-2-wt-sputtering-target-basis-rebuilt.png?v=1791402053"},{"product_id":"indium-tin-oxide-ito-sputtering-targets","title":"Indium Tin Oxide (ITO) Sputtering Targets","description":"\u003cp\u003eIndium Tin Oxide (ITO) Sputtering Targets is a source material for physical vapor deposition by sputtering. Indium tin oxide is a conductive oxide used in transparent electrode research. Common areas of inquiry include transparent conductive-film studies. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343089211,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-tin-oxide-ito-sputtering-targets-basis-rebuilt.png?v=1791402058"},{"product_id":"indium-tin-oxide-rotary-target","title":"Indium Tin Oxide Rotary Target","description":"\u003cp\u003eIndium Tin Oxide Rotary Target is a source material for physical vapor deposition by sputtering. Indium tin oxide is a conductive oxide used in transparent electrode research. Common areas of inquiry include transparent conductive-film studies. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343121979,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-tin-oxide-rotary-target-basis-rebuilt.png?v=1791402057"},{"product_id":"indium-zinc-oxide-izo-sputtering-target","title":"Indium Zinc Oxide (IZO) Sputtering Target","description":"\u003cp\u003eIndium Zinc Oxide (IZO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The IZO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343220283,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-zinc-oxide-izo-sputtering-target-basis-rebuilt.png?v=1791402058"},{"product_id":"indium-zinc-oxide-rotary-target","title":"Indium Zinc Oxide Rotary Target","description":"\u003cp\u003eIndium Zinc Oxide Rotary Target is a source material for physical vapor deposition by sputtering. The Indium Zinc Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343613499,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-zinc-oxide-rotary-target-basis-rebuilt.png?v=1791402060"},{"product_id":"iridium-oxide-iro2-sputtering-target","title":"Iridium Oxide (IrO2) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Iridium Oxide (IrO2) Sputtering Target provides the named material in target form. The IrO2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343810107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iridium-oxide-iro2-sputtering-target-basis-rebuilt.png?v=1791402063"},{"product_id":"iron-oxide-fe2o3-sputtering-target","title":"Iron Oxide (Fe2O3) Sputtering Target","description":"\u003cp\u003eIron Oxide (Fe2O3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Fe2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400345743419,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iron-oxide-fe2o3-sputtering-target-basis-rebuilt.png?v=1791402073"},{"product_id":"lanthanum-calcium-manganese-oxide-target","title":"Lanthanum Calcium Manganese Oxide Target","description":"\u003cp\u003eLanthanum Calcium Manganese Oxide Target brings the specified material system into a sputtering source for thin-film deposition. The Lanthanum Calcium Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400346857531,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-calcium-manganese-oxide-target-basis-rebuilt.png?v=1791402081"},{"product_id":"lanthanum-copper-oxide-sputtering-target","title":"Lanthanum Copper Oxide Sputtering Target","description":"\u003cp\u003eLanthanum Copper Oxide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Lanthanum Copper Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347086907,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-copper-oxide-sputtering-target-basis-rebuilt.png?v=1791402083"},{"product_id":"lanthanum-nickel-oxide-la2nio4-sputtering-target","title":"Lanthanum Nickel Oxide (La2NiO4) Sputtering Target","description":"\u003cp\u003eLanthanum Nickel Oxide (La2NiO4) Sputtering Target is a source material for physical vapor deposition by sputtering. The La2NiO4 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347447355,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-nickel-oxide-la2nio4-sputtering-target-basis-rebuilt.png?v=1791402089"},{"product_id":"lanthanum-niobium-oxide-lanbo3-sputtering-target","title":"Lanthanum Niobium Oxide (LaNbO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Lanthanum Niobium Oxide (LaNbO3) Sputtering Target provides the named material in target form. The LaNbO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347512891,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-niobium-oxide-lanbo3-sputtering-target-basis-rebuilt.png?v=1791402091"},{"product_id":"lanthanum-oxide-la2o3-sputtering-target","title":"Lanthanum Oxide (La2O3) Sputtering Target","description":"\u003cp\u003eLanthanum Oxide (La2O3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The La2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347611195,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-oxide-la2o3-sputtering-target-basis-rebuilt.png?v=1791402091"},{"product_id":"lanthanum-strontium-cobalt-iron-oxide-sputtering-target","title":"Lanthanum Strontium Cobalt Iron Oxide Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Lanthanum Strontium Cobalt Iron Oxide Sputtering Target provides the named material in target form. The Lanthanum Strontium Cobalt Iron Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347709499,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-strontium-cobalt-iron-oxide-sputtering-target-basis-rebuilt.png?v=1791402092"},{"product_id":"lanthanum-strontium-cobalt-oxide-target","title":"Lanthanum Strontium Cobalt Oxide Target","description":"\u003cp\u003eLanthanum Strontium Cobalt Oxide Target is a source material for physical vapor deposition by sputtering. The Lanthanum Strontium Cobalt Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347775035,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-strontium-cobalt-oxide-target-basis-rebuilt.png?v=1791402093"},{"product_id":"lanthanum-strontium-copper-oxide-la-1-x-srx-cuo4-sputtering-target","title":"Lanthanum Strontium Copper Oxide (La(1-x)Srx-CuO4) Sputtering Target","description":"\u003cp\u003eLanthanum Strontium Copper Oxide (La(1-x)Srx-CuO4) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Lanthanum Strontium Copper Oxide (La(1-x)Srx-CuO4) identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400347807803,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-strontium-copper-oxide-la-1-x-srx-cuo4-sputtering-target-basis-rebuilt.png?v=1791402095"},{"product_id":"lanthanum-vanadium-oxide-lavo3-sputtering-target","title":"Lanthanum Vanadium Oxide (LaVO3) Sputtering Target","description":"\u003cp\u003eLanthanum Vanadium Oxide (LaVO3) Sputtering Target is a source material for physical vapor deposition by sputtering. The LaVO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400348004411,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-vanadium-oxide-lavo3-sputtering-target-basis-rebuilt.png?v=1791402097"},{"product_id":"lead-oxide-pbo-sputtering-target","title":"Lead Oxide (PbO) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Lead Oxide (PbO) Sputtering Target provides the named material in target form. The PbO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400348332091,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lead-oxide-pbo-sputtering-target-basis-rebuilt.png?v=1791402102"},{"product_id":"lithium-cobalt-oxide-target","title":"Lithium Cobalt Oxide Target","description":"\u003cp\u003eFor sputtered thin-film work, Lithium Cobalt Oxide Target provides the named material in target form. The Lithium Cobalt Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400350101563,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-cobalt-oxide-target-basis-rebuilt.png?v=1791402117"},{"product_id":"lithium-lanthanum-titanium-oxide-sputtering-target","title":"Lithium Lanthanum Titanium Oxide Sputtering Target","description":"\u003cp\u003eLithium Lanthanum Titanium Oxide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Lithium Lanthanum Titanium Oxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400350462011,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-lanthanum-titanium-oxide-sputtering-target-basis-rebuilt.png?v=1791402122"},{"product_id":"lithium-manganese-oxide-target","title":"Lithium Manganese Oxide Target","description":"\u003cp\u003eLithium Manganese Oxide Target is a source material for physical vapor deposition by sputtering. The Lithium Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400350527547,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-manganese-oxide-target-basis-six-hole-copper-backing-2026-10-07.png?v=1791430427"},{"product_id":"lithium-nickel-cobalt-oxide-lini-1-x-cox-o2-sputtering-target","title":"Lithium Nickel Cobalt Oxide (LiNi(1-x)Cox-O2) Sputtering Target","description":"\u003cp\u003eLithium Nickel Cobalt Oxide (LiNi(1-x)Cox-O2) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Lithium Nickel Cobalt Oxide (LiNi(1-x)Cox-O2) identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400350560315,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-nickel-cobalt-oxide-lini-1-x-cox-o2-sputtering-target-basis-rebuilt.png?v=1791402123"},{"product_id":"lithium-nickel-manganese-oxide-target","title":"Lithium Nickel Manganese Oxide Target","description":"\u003cp\u003eLithium Nickel Manganese Oxide Target is a source material for physical vapor deposition by sputtering. The Lithium Nickel Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400350822459,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-nickel-manganese-oxide-target-basis-rebuilt.png?v=1791402124"}],"url":"https:\/\/basismaterials.com\/collections\/oxide-sputtering-targets.oembed?page=4","provider":"Basis Materials","version":"1.0","type":"link"}