{"title":"Pure Element Sputtering Targets","description":null,"products":[{"product_id":"copper-cu-sputtering-target","title":"Copper (Cu) Sputtering Target","description":"\u003cp\u003eCopper (Cu) Sputtering Target is a source material for physical vapor deposition by sputtering. Copper is valued for its electrical and thermal conductivity. Common areas of inquiry include conductive films and electrical-material research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400211951675,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-cu-sputtering-target-basis-rebuilt.png?v=1791401643"},{"product_id":"aluminum-al-sputtering-target","title":"Aluminum (Al) Sputtering Target","description":"\u003cp\u003eAluminum (Al) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum is a lightweight, electrically conductive metal. It may be specified for conductive films and coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310517819,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-al-sputtering-target.png?v=1791401872"},{"product_id":"aluminum-planar-target","title":"Aluminum Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Planar Target provides the named material in target form. Aluminum is a lightweight, electrically conductive metal. Researchers may consider this material for conductive films and coating research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321527867,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-planar-target.png?v=1791401888"},{"product_id":"aluminum-rotary-target","title":"Aluminum Rotary Target","description":"\u003cp\u003eAluminum Rotary Target is a source material for physical vapor deposition by sputtering. Aluminum is a lightweight, electrically conductive metal. Common areas of inquiry include conductive films and coating research. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321593403,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-rotary-target.png?v=1791401889"},{"product_id":"barium-ba-sputtering-target","title":"Barium (Ba) Sputtering Target","description":"\u003cp\u003eBarium (Ba) Sputtering Target is a source material for physical vapor deposition by sputtering. The Ba identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323723323,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-ba-sputtering-target-basis-rebuilt.png?v=1791401906"},{"product_id":"boron-b-sputtering-target","title":"Boron (B) Sputtering Target","description":"\u003cp\u003eBoron (B) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The B identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400326672443,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/boron-b-sputtering-target-basis-rebuilt.png?v=1791401930"},{"product_id":"cadmium-cd-sputtering-target","title":"Cadmium (Cd) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cadmium (Cd) Sputtering Target provides the named material in target form. The Cd identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400327327803,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cadmium-cd-sputtering-target-basis-rebuilt.png?v=1791401933"},{"product_id":"cerium-ce-sputtering-target","title":"Cerium (Ce) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cerium (Ce) Sputtering Target provides the named material in target form. The Ce identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400328278075,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cerium-ce-sputtering-target-basis-rebuilt.png?v=1791401946"},{"product_id":"cesium-sputtering-target","title":"Cesium Sputtering Target","description":"\u003cp\u003eCesium Sputtering Target is a source material for physical vapor deposition by sputtering. The Cs identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330407995,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cesium-sputtering-target-basis-rebuilt.png?v=1791401952"},{"product_id":"chromium-cr-sputtering-target","title":"Chromium (Cr) Sputtering Target","description":"\u003cp\u003eChromium (Cr) Sputtering Target is a source material for physical vapor deposition by sputtering. Chromium is used in corrosion-resistant and functional coating systems. Common areas of inquiry include protective coatings and thin-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400330702907,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-cr-sputtering-target.png?v=1791401954"},{"product_id":"chromium-planar-target","title":"Chromium Planar Target","description":"\u003cp\u003eChromium Planar Target is a source material for physical vapor deposition by sputtering. Chromium is used in corrosion-resistant and functional coating systems. Common areas of inquiry include protective coatings and thin-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400331522107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/chromium-planar-target.png?v=1791401964"},{"product_id":"cobalt-co-sputtering-target","title":"Cobalt (Co) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Cobalt (Co) Sputtering Target provides the named material in target form. The Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400333127739,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-co-sputtering-target.png?v=1791401976"},{"product_id":"cobalt-planar-target","title":"Cobalt Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Cobalt Planar Target provides the named material in target form. The Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400334962747,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-planar-target.png?v=1791401988"},{"product_id":"cobalt-rotary-target","title":"Cobalt Rotary Target","description":"\u003cp\u003eCobalt Rotary Target is a source material for physical vapor deposition by sputtering. The Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400335224891,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cobalt-rotary-target.png?v=1791401991"},{"product_id":"gold-au-sputtering-target","title":"Gold (Au) Sputtering Target","description":"\u003cp\u003eGold (Au) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Gold is a conductive noble metal that resists oxidation. It may be specified for electronic contacts and conductive-film research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400339910715,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/gold-au-sputtering-target-basis-rebuilt.png?v=1791402035"},{"product_id":"high-purity-aluminum-sputtering-target","title":"High Purity Aluminum Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, High Purity Aluminum Sputtering Target provides the named material in target form. Aluminum is a lightweight, electrically conductive metal. Researchers may consider this material for conductive films and coating research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400340762683,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/high-purity-aluminum-sputtering-target.png?v=1791402042"},{"product_id":"high-purity-chromium-sputtering-target","title":"High Purity Chromium Sputtering Target","description":"\u003cp\u003eHigh Purity Chromium Sputtering Target is a source material for physical vapor deposition by sputtering. Chromium is used in corrosion-resistant and functional coating systems. Common areas of inquiry include protective coatings and thin-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400340992059,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/high-purity-chromium-sputtering-target.png?v=1791402043"},{"product_id":"high-purity-platinum-sputtering-target","title":"High Purity Platinum Sputtering Target","description":"\u003cp\u003eHigh Purity Platinum Sputtering Target is a source material for physical vapor deposition by sputtering. Platinum is a noble metal valued for chemical stability. Common areas of inquiry include electrode and catalytic-material research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400341123131,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/high-purity-platinum-sputtering-target.png?v=1791402044"},{"product_id":"high-purity-titanium-sputtering-target","title":"High Purity Titanium Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, High Purity Titanium Sputtering Target provides the named material in target form. Titanium is a lightweight metal known for corrosion resistance. Researchers may consider this material for functional coatings and materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400341418043,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/high-purity-titanium-sputtering-target.png?v=1791402044"},{"product_id":"indium-in-sputtering-target","title":"Indium (In) Sputtering Target","description":"\u003cp\u003eIndium (In) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Indium is a soft metal used in electronic and thin-film materials. It may be specified for electronic thin films and materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400341712955,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/indium-in-sputtering-target-basis-rebuilt.png?v=1791402047"},{"product_id":"iridium-ir-sputtering-target","title":"Iridium (Ir) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Iridium (Ir) Sputtering Target provides the named material in target form. The Ir identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343646267,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iridium-ir-sputtering-target.png?v=1791402061"},{"product_id":"iron-fe-sputtering-target","title":"Iron (Fe) Sputtering Target","description":"\u003cp\u003eIron (Fe) Sputtering Target is a source material for physical vapor deposition by sputtering. The Fe identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400343842875,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iron-fe-sputtering-target.png?v=1791402062"},{"product_id":"iron-rotary-target","title":"Iron Rotary Target","description":"\u003cp\u003eIron Rotary Target is a source material for physical vapor deposition by sputtering. The Fe identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400345808955,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iron-rotary-target.png?v=1791402073"},{"product_id":"lanthanum-la-sputtering-target","title":"Lanthanum (La) Sputtering Target","description":"\u003cp\u003eLanthanum (La) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The La identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400346529851,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lanthanum-la-sputtering-target-basis-rebuilt.png?v=1791402078"},{"product_id":"lead-pb-sputtering-target","title":"Lead (Pb) Sputtering Target","description":"\u003cp\u003eLead (Pb) Sputtering Target is a source material for physical vapor deposition by sputtering. The Pb identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400348102715,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lead-pb-sputtering-target-basis-rebuilt.png?v=1791402099"},{"product_id":"lead-planar-target","title":"Lead Planar Target","description":"\u003cp\u003eLead Planar Target is a source material for physical vapor deposition by sputtering. The Pb identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400348397627,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lead-planar-target-basis-rebuilt.png?v=1791402104"},{"product_id":"lithium-li-sputtering-target","title":"Lithium (Li) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Lithium (Li) Sputtering Target provides the named material in target form. The Li identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400349577275,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-li-sputtering-target-basis-rebuilt.png?v=1791402114"},{"product_id":"lithium-borate-sputtering-target","title":"Lithium Borate Sputtering Target","description":"\u003cp\u003eLithium Borate Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Li identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400349773883,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-borate-sputtering-target-basis-rebuilt.png?v=1791402115"},{"product_id":"lithium-silicate-sputtering-target","title":"Lithium Silicate Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Lithium Silicate Sputtering Target provides the named material in target form. The Li identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400351248443,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/lithium-silicate-sputtering-target-basis-rebuilt.png?v=1791402131"},{"product_id":"manganese-mn-sputtering-target","title":"Manganese (Mn) Sputtering Target","description":"\u003cp\u003eManganese (Mn) Sputtering Target is a source material for physical vapor deposition by sputtering. The Mn identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400352690235,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/manganese-mn-sputtering-target-basis-rebuilt.png?v=1791402144"},{"product_id":"manganese-rotary-target","title":"Manganese Rotary Target","description":"\u003cp\u003eManganese Rotary Target brings the specified material system into a sputtering source for thin-film deposition. The Mn identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400354099259,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/manganese-rotary-target-basis-rebuilt.png?v=1791402154"},{"product_id":"molybdenum-mo-sputtering-target","title":"Molybdenum (Mo) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Molybdenum (Mo) Sputtering Target provides the named material in target form. Molybdenum is a refractory metal used where thermal stability matters. Researchers may consider this material for thin-film and high-temperature materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400354787387,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/molybdenum-mo-sputtering-target.png?v=1791402160"},{"product_id":"molybdenum-rotary-target","title":"Molybdenum Rotary Target","description":"\u003cp\u003eMolybdenum Rotary Target brings the specified material system into a sputtering source for thin-film deposition. Molybdenum is a refractory metal used where thermal stability matters. It may be specified for thin-film and high-temperature materials research. The tubular geometry should be matched to the rotary cathode and coating system. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400356229179,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/molybdenum-rotary-target.png?v=1791402169"},{"product_id":"n-type-silicon-si-sputtering-target","title":"N-type Silicon (Si) Sputtering Target","description":"\u003cp\u003eN-type Silicon (Si) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400357048379,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/n-type-silicon-si-sputtering-target-basis-rebuilt.png?v=1791402177"},{"product_id":"neodymium-nd-sputtering-target","title":"Neodymium (Nd) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Neodymium (Nd) Sputtering Target provides the named material in target form. The Nd identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400357212219,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/neodymium-nd-sputtering-target-basis-rebuilt.png?v=1791402179"},{"product_id":"nickel-ni-sputtering-target","title":"Nickel (Ni) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Nickel (Ni) Sputtering Target provides the named material in target form. The Ni identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400357933115,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/nickel-ni-sputtering-target.png?v=1791402185"},{"product_id":"nickel-rotary-target","title":"Nickel Rotary Target","description":"\u003cp\u003eFor sputtered thin-film work, Nickel Rotary Target provides the named material in target form. The Ni identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400361013307,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/nickel-rotary-target.png?v=1791402212"},{"product_id":"niobium-nb-sputtering-target","title":"Niobium (Nb) Sputtering Target","description":"\u003cp\u003eNiobium (Nb) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Niobium is a refractory metal used in superconducting and functional-material research. It may be specified for superconducting films and electronic-material studies. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400361734203,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/niobium-nb-sputtering-target.png?v=1791402218"},{"product_id":"niobium-planar-target","title":"Niobium Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Niobium Planar Target provides the named material in target form. Niobium is a refractory metal used in superconducting and functional-material research. Researchers may consider this material for superconducting films and electronic-material studies. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400362717243,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/niobium-planar-target.png?v=1791402224"},{"product_id":"niobium-rotary-target","title":"Niobium Rotary Target","description":"\u003cp\u003eNiobium Rotary Target is a source material for physical vapor deposition by sputtering. Niobium is a refractory metal used in superconducting and functional-material research. Common areas of inquiry include superconducting films and electronic-material studies. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400363044923,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/niobium-rotary-target.png?v=1791402226"},{"product_id":"niobium-stannide-sputtering-target","title":"Niobium Stannide Sputtering Target","description":"\u003cp\u003eNiobium Stannide Sputtering Target is a source material for physical vapor deposition by sputtering. Niobium is a refractory metal used in superconducting and functional-material research. Common areas of inquiry include superconducting films and electronic-material studies. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400363372603,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/niobium-stannide-sputtering-target-basis-rebuilt.png?v=1791402229"},{"product_id":"osmium-os-sputtering-target","title":"Osmium (Os) Sputtering Target","description":"\u003cp\u003eOsmium (Os) Sputtering Target is a source material for physical vapor deposition by sputtering. The Os identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400363765819,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/osmium-os-sputtering-target.png?v=1791402233"},{"product_id":"p-type-silicon-si-sputtering-target","title":"P-type Silicon (Si) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, P-type Silicon (Si) Sputtering Target provides the named material in target form. The Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400364224571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/p-type-silicon-si-sputtering-target-basis-rebuilt.png?v=1791402234"},{"product_id":"palladium-pd-sputtering-target","title":"Palladium (Pd) Sputtering Target","description":"\u003cp\u003ePalladium (Pd) Sputtering Target is a source material for physical vapor deposition by sputtering. The Pd identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400364257339,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/palladium-pd-sputtering-target.png?v=1791402236"},{"product_id":"planar-copper-cu-sputtering-target","title":"Planar Copper (Cu) Sputtering Target","description":"\u003cp\u003ePlanar Copper (Cu) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Copper is valued for its electrical and thermal conductivity. It may be specified for conductive films and electrical-material research. Source geometry and installation details are reviewed for the intended sputtering equipment. 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Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400364453947,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/planar-molybdenum-mo-sputtering-target.png?v=1791402239"},{"product_id":"planar-titanium-ti-sputtering-target","title":"Planar Titanium (Ti) Sputtering Target","description":"\u003cp\u003ePlanar Titanium (Ti) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Titanium is a lightweight metal known for corrosion resistance. It may be specified for functional coatings and materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. 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