{"title":"Sputtering Targets","description":null,"products":[{"product_id":"copper-cu-sputtering-target","title":"Copper (Cu) Sputtering Target","description":"\u003cp\u003eCopper (Cu) Sputtering Target is a source material for physical vapor deposition by sputtering. Copper is valued for its electrical and thermal conductivity. Common areas of inquiry include conductive films and electrical-material research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400211951675,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-cu-sputtering-target-basis-rebuilt.png?v=1791401643"},{"product_id":"titanium-sputtering-target","title":"Titanium Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Titanium Sputtering Target provides the named material in target form. Titanium is a lightweight metal known for corrosion resistance. Researchers may consider this material for functional coatings and materials research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials Dev Store","offers":[{"title":"Default Title","offer_id":44400218112059,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/titanium-sputtering-target.png?v=1791401670"},{"product_id":"tungsten-sputtering-target","title":"Tungsten Sputtering Target","description":"\u003cp\u003eTungsten Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Tungsten is a refractory metal with a high melting point. It may be specified for high-temperature materials research and thin-film coating studies. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials Dev Store","offers":[{"title":"Default Title","offer_id":44400219226171,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/tungsten-sputtering-target.png?v=1791401673"},{"product_id":"aluminum-al-sputtering-target","title":"Aluminum (Al) Sputtering Target","description":"\u003cp\u003eAluminum (Al) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum is a lightweight, electrically conductive metal. It may be specified for conductive films and coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310517819,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-al-sputtering-target.png?v=1791401872"},{"product_id":"aluminum-chromium-al-cr-sputtering-target","title":"Aluminum Chromium (Al\/Cr) Sputtering Target","description":"\u003cp\u003eAluminum Chromium (Al\/Cr) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Cr identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310583355,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-chromium-al-cr-sputtering-target.png?v=1791401872"},{"product_id":"aluminum-antimonide-sputtering-target","title":"Aluminum Antimonide Sputtering Target","description":"\u003cp\u003eAluminum Antimonide Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Antimonide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310648891,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-antimonide-sputtering-target-basis-rebuilt.png?v=1791401872"},{"product_id":"aluminum-boride-alb2-sputtering-target","title":"Aluminum Boride (AlB2) Sputtering Target","description":"\u003cp\u003eAluminum Boride (AlB2) Sputtering Target is a source material for physical vapor deposition by sputtering. The AlB2 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310779963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-boride-alb2-sputtering-target-basis-rebuilt.png?v=1791401874"},{"product_id":"aluminum-chromium-titanium-vanadium-planar-target","title":"Aluminum Chromium Titanium Vanadium Planar Target","description":"\u003cp\u003eAluminum Chromium Titanium Vanadium Planar Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Chromium Titanium Vanadium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310845499,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-chromium-titanium-vanadium-planar-target.png?v=1791401877"},{"product_id":"aluminum-cobalt-al-co-sputtering-target","title":"Aluminum Cobalt (Al\/Co) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Cobalt (Al\/Co) Sputtering Target provides the named material in target form. The Al\/Co identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310878267,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-cobalt-al-co-sputtering-target.png?v=1791401876"},{"product_id":"aluminum-copper-al-cu-sputtering-target","title":"Aluminum Copper (Al\/Cu) Sputtering Target","description":"\u003cp\u003eAluminum Copper (Al\/Cu) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Cu identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311042107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-al-cu-sputtering-target-basis-rebuilt.png?v=1791401876"},{"product_id":"aluminum-copper-planar-sputtering-target","title":"Aluminum Copper Planar Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Copper Planar Sputtering Target provides the named material in target form. The Aluminum Copper Planar identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311271483,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-planar-sputtering-target-basis-rebuilt.png?v=1791401877"},{"product_id":"aluminum-copper-silicon-al-cu-si-sputtering-target","title":"Aluminum Copper Silicon (Al\/Cu\/Si) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Copper Silicon (Al\/Cu\/Si) Sputtering Target provides the named material in target form. The Al\/Cu\/Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311304251,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-copper-silicon-al-cu-si-sputtering-target-basis-rebuilt.png?v=1791401878"},{"product_id":"aluminum-fluoride-alf3-sputtering-target","title":"Aluminum Fluoride (AlF3) Sputtering Target","description":"\u003cp\u003eAluminum Fluoride (AlF3) Sputtering Target is a source material for physical vapor deposition by sputtering. The AlF3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311730235,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-fluoride-alf3-sputtering-target-basis-rebuilt.png?v=1791401879"},{"product_id":"aluminum-lithium-al-li-sputtering-target","title":"Aluminum Lithium (Al\/Li) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Lithium (Al\/Li) Sputtering Target provides the named material in target form. The Al\/Li identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311763003,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-lithium-al-li-sputtering-target-basis-rebuilt.png?v=1791401880"},{"product_id":"aluminum-gallium-antimonide-target","title":"Aluminum Gallium Antimonide Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Gallium Antimonide Target provides the named material in target form. The Aluminum Gallium Antimonide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311828539,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-gallium-antimonide-target-basis-rebuilt.png?v=1791401880"},{"product_id":"aluminum-magnesium-al-mg-sputtering-target","title":"Aluminum Magnesium (Al\/Mg) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Magnesium (Al\/Mg) Sputtering Target provides the named material in target form. The Al\/Mg identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311894075,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-magnesium-al-mg-sputtering-target.png?v=1791401880"},{"product_id":"aluminum-manganese-sputtering-target","title":"Aluminum Manganese Sputtering Target","description":"\u003cp\u003eAluminum Manganese Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Manganese identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400311992379,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-manganese-sputtering-target-basis-rebuilt.png?v=1791401882"},{"product_id":"aluminum-neodymium-sputtering-target","title":"Aluminum Neodymium Sputtering Target","description":"\u003cp\u003eAluminum Neodymium Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Neodymium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312090683,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-neodymium-sputtering-target-basis-rebuilt.png?v=1791401883"},{"product_id":"aluminum-nickel-al-ni-sputtering-target","title":"Aluminum Nickel (Al\/Ni) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Nickel (Al\/Ni) Sputtering Target provides the named material in target form. The Al\/Ni identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312188987,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nickel-al-ni-sputtering-target.png?v=1791401884"},{"product_id":"aluminum-nickel-planar-target","title":"Aluminum Nickel Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Nickel Planar Target provides the named material in target form. The Aluminum Nickel identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312418363,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nickel-planar-target.png?v=1791401885"},{"product_id":"aluminum-oxide-al2o3-sputtering-target","title":"Aluminum Oxide (Al2O3) Sputtering Target","description":"\u003cp\u003eAluminum Oxide (Al2O3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Aluminum oxide is an electrically insulating ceramic. It may be specified for dielectric and protective coating research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400312778811,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-al2o3-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-nitride-aln-sputtering-target","title":"Aluminum Nitride (AlN) Sputtering Target","description":"\u003cp\u003eAluminum Nitride (AlN) Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum nitride is a ceramic valued for thermal conductivity and electrical insulation. Common areas of inquiry include electronic and functional-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400314449979,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-nitride-aln-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-oxide-planar-sputtering-target","title":"Aluminum Oxide Planar Sputtering Target","description":"\u003cp\u003eAluminum Oxide Planar Sputtering Target is a source material for physical vapor deposition by sputtering. Aluminum oxide is an electrically insulating ceramic. Common areas of inquiry include dielectric and protective coating research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400314581051,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-oxide-planar-sputtering-target-basis-rebuilt.png?v=1791401886"},{"product_id":"aluminum-planar-target","title":"Aluminum Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Planar Target provides the named material in target form. Aluminum is a lightweight, electrically conductive metal. Researchers may consider this material for conductive films and coating research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321527867,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-planar-target.png?v=1791401888"},{"product_id":"aluminum-rotary-target","title":"Aluminum Rotary Target","description":"\u003cp\u003eAluminum Rotary Target is a source material for physical vapor deposition by sputtering. Aluminum is a lightweight, electrically conductive metal. Common areas of inquiry include conductive films and coating research. The tubular geometry should be matched to the rotary cathode and coating system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321593403,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-rotary-target.png?v=1791401889"},{"product_id":"aluminum-selenide-sputtering-target","title":"Aluminum Selenide Sputtering Target","description":"\u003cp\u003eAluminum Selenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Selenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321658939,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-selenide-sputtering-target-basis-rebuilt.png?v=1791401889"},{"product_id":"aluminum-silicon-al-si-sputtering-target","title":"Aluminum Silicon (Al\/Si) Sputtering Target","description":"\u003cp\u003eAluminum Silicon (Al\/Si) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Si identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321790011,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-al-si-sputtering-target-basis-rebuilt.png?v=1791401890"},{"product_id":"aluminum-silicon-copper-al-si-cu-sputtering-target","title":"Aluminum Silicon Copper (Al\/Si\/Cu) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Silicon Copper (Al\/Si\/Cu) Sputtering Target provides the named material in target form. The Al\/Si\/Cu identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321921083,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-copper-al-si-cu-sputtering-target-basis-rebuilt.png?v=1791401892"},{"product_id":"aluminum-silicon-planar-target","title":"Aluminum Silicon Planar Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Silicon Planar Target provides the named material in target form. The Aluminum Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400321986619,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-silicon-planar-target-basis-rebuilt.png?v=1791401891"},{"product_id":"aluminum-telluride-alte-sputtering-target","title":"Aluminum Telluride (AlTe) Sputtering Target","description":"\u003cp\u003eAluminum Telluride (AlTe) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The AlTe identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322117691,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-telluride-alte-sputtering-target-basis-rebuilt.png?v=1791401892"},{"product_id":"aluminum-tin-copper-planar-target","title":"Aluminum Tin Copper Planar Target","description":"\u003cp\u003eAluminum Tin Copper Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Tin Copper identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322248763,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-planar-target-basis-rebuilt.png?v=1791401893"},{"product_id":"aluminum-tin-copper-rotary-sputtering-target","title":"Aluminum Tin Copper Rotary Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Tin Copper Rotary Sputtering Target provides the named material in target form. The Aluminum Tin Copper Rotary identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The tubular geometry should be matched to the rotary cathode and coating system. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322641979,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-rotary-sputtering-target-basis-rebuilt.png?v=1791401895"},{"product_id":"aluminum-tin-copper-target","title":"Aluminum Tin Copper Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum Tin Copper Target provides the named material in target form. The Aluminum Tin Copper Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322707515,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-tin-copper-target-basis-rebuilt.png?v=1791401895"},{"product_id":"aluminum-titanium-al-ti-sputtering-target","title":"Aluminum Titanium (Al\/Ti) Sputtering Target","description":"\u003cp\u003eAluminum Titanium (Al\/Ti) Sputtering Target is a source material for physical vapor deposition by sputtering. The Al\/Ti identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322838587,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-titanium-al-ti-sputtering-target.png?v=1791401897"},{"product_id":"aluminum-titanium-silicon-planar-target","title":"Aluminum Titanium Silicon Planar Target","description":"\u003cp\u003eAluminum Titanium Silicon Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Titanium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400322904123,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-titanium-silicon-planar-target-basis-rebuilt.png?v=1791401897"},{"product_id":"aluminum-zinc-indium-silicon-planar-target","title":"Aluminum Zinc Indium Silicon Planar Target","description":"\u003cp\u003eAluminum Zinc Indium Silicon Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Zinc Indium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323002427,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-zinc-indium-silicon-planar-target-basis-rebuilt.png?v=1791401898"},{"product_id":"aluminum-doped-lithium-manganese-oxide-target","title":"Aluminum-doped Lithium Manganese Oxide Target","description":"\u003cp\u003eFor sputtered thin-film work, Aluminum-doped Lithium Manganese Oxide Target provides the named material in target form. The Aluminum-doped Lithium Manganese Oxide Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323067963,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-lithium-manganese-oxide-target-basis-rebuilt.png?v=1791401899"},{"product_id":"aluminum-doped-zinc-oxide-azo-sputtering-target","title":"Aluminum-doped Zinc Oxide (AZO) Sputtering Target","description":"\u003cp\u003eAluminum-doped Zinc Oxide (AZO) Sputtering Target is a source material for physical vapor deposition by sputtering. The AZO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323100731,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-doped-zinc-oxide-azo-sputtering-target-basis-rebuilt.png?v=1791401900"},{"product_id":"antimony-indium-tin-sb-in-sn-sputtering-target","title":"Antimony Indium Tin (Sb\/In\/Sn) Sputtering Target","description":"\u003cp\u003eAntimony Indium Tin (Sb\/In\/Sn) Sputtering Target is a source material for physical vapor deposition by sputtering. The Sb\/In\/Sn identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323166267,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-indium-tin-sb-in-sn-sputtering-target-basis-rebuilt.png?v=1791401900"},{"product_id":"antimony-sulfide-sb2s3-sputtering-target","title":"Antimony Sulfide (Sb2S3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Antimony Sulfide (Sb2S3) Sputtering Target provides the named material in target form. The Sb2S3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323231803,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-sulfide-sb2s3-sputtering-target-basis-six-hole-copper-backing-2026-10-07.png?v=1791430471"},{"product_id":"antimony-telluride-sb2te3-sputtering-target","title":"Antimony Telluride (Sb2Te3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Antimony Telluride (Sb2Te3) Sputtering Target provides the named material in target form. The Sb2Te3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323264571,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-telluride-sb2te3-sputtering-target-basis-rebuilt.png?v=1791401902"},{"product_id":"antimony-triselenide-sputtering-target","title":"Antimony Triselenide Sputtering Target","description":"\u003cp\u003eAntimony Triselenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Antimony Triselenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323330107,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-triselenide-sputtering-target-basis-rebuilt.png?v=1791401903"},{"product_id":"antimony-doped-tin-oxide-ato-sputtering-target","title":"Antimony-Doped Tin Oxide (ATO) Sputtering Target","description":"\u003cp\u003eAntimony-Doped Tin Oxide (ATO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The ATO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323395643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/antimony-doped-tin-oxide-ato-sputtering-target-basis-rebuilt.png?v=1791401904"},{"product_id":"arsenic-triselenide-sputtering-target","title":"Arsenic Triselenide Sputtering Target","description":"\u003cp\u003eArsenic Triselenide Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Arsenic Triselenide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323461179,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/arsenic-triselenide-sputtering-target-basis-rebuilt.png?v=1791401904"},{"product_id":"arsenic-trisulfide-as2s3-sputtering-target","title":"Arsenic Trisulfide (As2S3) Sputtering Target","description":"\u003cp\u003eArsenic Trisulfide (As2S3) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The As2S3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323526715,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/arsenic-trisulfide-as2s3-sputtering-target-basis-rebuilt.png?v=1791401905"},{"product_id":"barium-ba-sputtering-target","title":"Barium (Ba) Sputtering Target","description":"\u003cp\u003eBarium (Ba) Sputtering Target is a source material for physical vapor deposition by sputtering. The Ba identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323723323,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-ba-sputtering-target-basis-rebuilt.png?v=1791401906"},{"product_id":"barium-aluminum-alloy-target","title":"Barium Aluminum Alloy Target","description":"\u003cp\u003eBarium Aluminum Alloy Target brings the specified material system into a sputtering source for thin-film deposition. The Barium Aluminum Alloy Target identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400323788859,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-aluminum-alloy-target-basis-rebuilt.png?v=1791401907"},{"product_id":"barium-carbonate-sputtering-target","title":"Barium Carbonate Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Carbonate Sputtering Target provides the named material in target form. The Barium Carbonate identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324018235,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-carbonate-sputtering-target-basis-rebuilt.png?v=1791401907"},{"product_id":"barium-cerium-oxide-baceo3-sputtering-target","title":"Barium Cerium Oxide (BaCeO3) Sputtering Target","description":"\u003cp\u003eFor sputtered thin-film work, Barium Cerium Oxide (BaCeO3) Sputtering Target provides the named material in target form. The BaCeO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324214843,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-cerium-oxide-baceo3-sputtering-target-basis-rebuilt.png?v=1791401908"},{"product_id":"barium-ferrite-bafe12o19-sputtering-target","title":"Barium Ferrite (BaFe12O19) Sputtering Target","description":"\u003cp\u003eBarium Ferrite (BaFe12O19) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The BaFe12O19 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400324247611,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/barium-ferrite-bafe12o19-sputtering-target-basis-rebuilt.png?v=1791401910"}],"url":"https:\/\/basismaterials.com\/collections\/sputtering-targets.oembed?page=2","provider":"Basis Materials","version":"1.0","type":"link"}