{"product_id":"aluminum-antimonide-sputtering-target","title":"Aluminum Antimonide Sputtering Target","description":"\u003cp\u003eAluminum Antimonide Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Antimonide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400310648891,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/aluminum-antimonide-sputtering-target-basis-rebuilt.png?v=1791401872","url":"https:\/\/basismaterials.com\/products\/aluminum-antimonide-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}