{"product_id":"cocrfenial-high-entropy-alloy-sputtering-target","title":"CoCrFeNiAl High Entropy Alloy Sputtering Target","description":"\u003cp\u003eCoCrFeNiAl High Entropy Alloy Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. It may be specified for multi-principal-element materials research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400332767291,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/cocrfenial-high-entropy-alloy-sputtering-target.png?v=1791401974","url":"https:\/\/basismaterials.com\/products\/cocrfenial-high-entropy-alloy-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}