{"product_id":"copper-cu-sputtering-target","title":"Copper (Cu) Sputtering Target","description":"\u003cp\u003eCopper (Cu) Sputtering Target is a source material for physical vapor deposition by sputtering. Copper is valued for its electrical and thermal conductivity. Common areas of inquiry include conductive films and electrical-material research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400211951675,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-cu-sputtering-target-basis-rebuilt.png?v=1791401643","url":"https:\/\/basismaterials.com\/products\/copper-cu-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}