{"product_id":"copper-indium-cu-in-sputtering-target","title":"Copper Indium (Cu\/In) Sputtering Target","description":"\u003cp\u003eCopper Indium (Cu\/In) Sputtering Target is a source material for physical vapor deposition by sputtering. The Cu\/In identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400336109627,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/copper-indium-cu-in-sputtering-target-basis-rebuilt.png?v=1791402002","url":"https:\/\/basismaterials.com\/products\/copper-indium-cu-in-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}