{"product_id":"iron-oxide-fe2o3-sputtering-target","title":"Iron Oxide (Fe2O3) Sputtering Target","description":"\u003cp\u003eIron Oxide (Fe2O3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Fe2O3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400345743419,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/iron-oxide-fe2o3-sputtering-target-basis-rebuilt.png?v=1791402073","url":"https:\/\/basismaterials.com\/products\/iron-oxide-fe2o3-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}