{"product_id":"niobium-doped-titanium-dioxide-sputtering-target","title":"Niobium-doped Titanium Dioxide Sputtering Target","description":"\u003cp\u003eNiobium-doped Titanium Dioxide Sputtering Target is a source material for physical vapor deposition by sputtering. The Niobium-doped Titanium Dioxide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400363667515,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/niobium-doped-titanium-dioxide-sputtering-target-basis-rebuilt.png?v=1791402233","url":"https:\/\/basismaterials.com\/products\/niobium-doped-titanium-dioxide-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}