{"product_id":"planar-copper-cu-sputtering-target","title":"Planar Copper (Cu) Sputtering Target","description":"\u003cp\u003ePlanar Copper (Cu) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. Copper is valued for its electrical and thermal conductivity. It may be specified for conductive films and electrical-material research. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400364355643,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/planar-copper-cu-sputtering-target-basis-rebuilt-v2.png?v=1791402238","url":"https:\/\/basismaterials.com\/products\/planar-copper-cu-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}