{"product_id":"planar-tungsten-w-sputtering-target","title":"Planar Tungsten (W) Sputtering Target","description":"\u003cp\u003ePlanar Tungsten (W) Sputtering Target is a source material for physical vapor deposition by sputtering. Tungsten is a refractory metal with a high melting point. Common areas of inquiry include high-temperature materials research and thin-film coating studies. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.\u003c\/p\u003e","brand":"Basis Materials","offers":[{"title":"Default Title","offer_id":44400364879931,"sku":null,"price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0700\/9760\/0571\/files\/planar-tungsten-w-sputtering-target.png?v=1791402241","url":"https:\/\/basismaterials.com\/products\/planar-tungsten-w-sputtering-target","provider":"Basis Materials","version":"1.0","type":"link"}