Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Aluminum Antimonide Sputtering Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Aluminum Antimonide Sputtering Target is a source material for physical vapor deposition by sputtering. The Aluminum Antimonide identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Constituent elements | Al and Sb |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Aluminum Antimonide Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.