Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Aluminum Chromium Titanium Vanadium Planar Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Aluminum Chromium Titanium Vanadium Planar Target brings the specified material system into a sputtering source for thin-film deposition. The Aluminum Chromium Titanium Vanadium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Metal Alloy |
|---|---|
| Constituent elements | Al, Cr, Ti, and V |
| Form | Sputtering Target |
| Custom options available | true |
| Target configuration | Planar |
| Availability | Made to Order |
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Aluminum Chromium Titanium Vanadium Planar Target is included automatically. Tell us the form, size and quantity you need; other details are optional.