Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Overview
Technical Specifications
| Material | Aluminum |
|---|---|
| Chemical symbol | Al |
| Form | Sputtering Target |
| Target configuration | Rotary |
| Purity options | ≥99.99% |
| Shape options | Tubular |
| Deposition method (reference) | DC |
| Bonding options | Indium, Elastomer |
| Standard atomic weight (reference) | 26.982 ± 0.001 |
| Density (reference) | 2.70 g/cm³ |
| Melting point (reference) | 660.323 °C |
| Thermal conductivity (reference) | 235 W/m·K |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Protective coating development
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
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Tell us what you need
Aluminum Rotary Target is included automatically. Tell us the form, size and quantity you need; other details are optional.