Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Aluminum Titanium Silicon Planar Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Aluminum Titanium Silicon Planar Target is a source material for physical vapor deposition by sputtering. The Aluminum Titanium Silicon identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Metal Alloy |
|---|---|
| Constituent elements | Al, Ti, and Si |
| Form | Sputtering Target |
| Custom options available | true |
| Target configuration | Planar |
| Availability | Made to Order |
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Aluminum Titanium Silicon Planar Target is included automatically. Tell us the form, size and quantity you need; other details are optional.