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Basis Materials representative image of Antimony-Doped Tin Oxide (ATO) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Antimony-Doped Tin Oxide (ATO) Sputtering Target

Grade / formula: ATO

Made to Order

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Overview

Antimony-Doped Tin Oxide (ATO) Sputtering Target is offered for photovoltaic thin films. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Antimony-Doped Tin Oxide (ATO)
Formula / designation ATO
Form Sputtering Target
CAS number 128221-48-7
Purity options ≥99%
Shape options Discs
Diameter 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm
Thickness 6.35 mm, 3.175 mm
Density (reference) 6.8 g/cm³

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Photovoltaic thin films
  • Electrodes and electrical contacts
  • Transparent conductive coatings

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Request a product-specific SDS

Please request the SDS for your specific material and configuration.

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Tell us what you need

Antimony-Doped Tin Oxide (ATO) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.