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Basis Materials representative image of Bismuth Antimony (Bi/Sb) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Bismuth Antimony (Bi/Sb) Sputtering Target

Grade / formula: Bi/Sb

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Specifications and availability are confirmed during quotation.

Bismuth Antimony (Bi/Sb) Sputtering Target is a source material for physical vapor deposition by sputtering. The Bi/Sb identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.

Technical specifications

Material familyMetal Alloy
Material / GradeBi/Sb
Constituent elementsBi and Sb
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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