Skip to content
BASIS Materials Purity & Precision sales@basismaterials.com
REQUEST A QUOTE
Basis Materials representative image of Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target

Grade / formula: Bi3Fe5O12

Made to Order

Request a quote

Overview

Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Bismuth Iron Oxide (Bi3Fe5O12)
Formula / designation Bi3Fe5O12
Form Sputtering Target
CAS number 12022-60-3
Purity options ≥99%
Shape options Discs
Diameter 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm
Thickness 6.35 mm, 3.175 mm
Molar mass (formula reference) 1098.15 g/mol

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.