Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Bismuth Manganate (Bi2.4MnO3) Sputtering Target
Grade / formula: Bi2.4MnO3
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
For sputtered thin-film work, Bismuth Manganate (Bi2.4MnO3) Sputtering Target provides the named material in target form. The Bi2.4MnO3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | Bi2.4MnO3 |
| Constituent elements | Bi, Mn, and O |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Bismuth Manganate (Bi2.4MnO3) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.