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Basis Materials representative image of Bismuth Manganate (Bi2.4MnO3) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Bismuth Manganate (Bi2.4MnO3) Sputtering Target

Grade / formula: Bi2.4MnO3

Made to Order

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Overview

Bismuth Manganate (Bi2.4MnO3) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Bismuth Manganate (Bi2.4MnO3)
Formula / designation Bi2.4MnO3
Form Sputtering Target
Purity options ≥99%
Shape options Discs
Bonding options Indium, Elastomer
Density (reference) 7.0 g/cm³

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Optical coatings

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Please request the SDS for your specific material and configuration.

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Tell us what you need

Bismuth Manganate (Bi2.4MnO3) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.