Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Boron (B) Sputtering Target
Grade / formula: B
Made to Order
Request a quoteOverview
Technical Specifications
| Material | Boron (B) |
|---|---|
| Formula / designation | B |
| Form | Sputtering Target |
| Deposition method (reference) | RF |
| Bonding options | |
| Purity options | |
| Size options |
View all 8 options |
| CAS number | 7440-42-8 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Density (reference) | 2.34 g/cm³ |
| Thermal conductivity (reference) | 27 W/m.K |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
REQUEST A QUOTE
Tell us what you need
Boron (B) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.