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Basis Materials representative image of Boron Carbide (B4C) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Boron Carbide (B4C) Sputtering Target

Grade / formula: B4C

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Specifications and availability are confirmed during quotation.

For sputtered thin-film work, Boron Carbide (B4C) Sputtering Target provides the named material in target form. Boron carbide is a hard ceramic compound. Researchers may consider this material for protective coating and ceramic-film research. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.

Technical specifications

Material familyCeramic / Compound
Material / GradeB4C
Constituent elementsB and C
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Boron Carbide (B4C) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.