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Basis Materials representative image of Boron Nitride (BN) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Boron Nitride (BN) Sputtering Target

Grade / formula: BN

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Specifications and availability are confirmed during quotation.

Boron Nitride (BN) Sputtering Target is a source material for physical vapor deposition by sputtering. Boron nitride is a ceramic compound used in insulating and protective material systems. Common areas of inquiry include ceramic-film research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.

Technical specifications

Material familyCeramic / Compound
Material / GradeBN
Constituent elementsB and N
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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