Skip to content
Basis Materials representative image of Cesium Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Cesium Sputtering Target

Grade / formula: Cs

Made to Order

Request a quote

Overview

Cesium Sputtering Target is offered for thin-film deposition research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Technical specifications
Material Cesium
Chemical symbol Cs
Form Sputtering Target
CAS number 7440-46-2
Purity options
  • 99.9%
  • 99.95%
  • 99.99%
Shape options Discs, Plates, Column Targets, Step Targets
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″
Standard atomic weight (reference) 132.91 ± 0.01
Density (reference) 1.873 g/cm³
Melting point (reference) 28.5 °C

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Cesium Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.