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Representative image of Cobalt Nickel (Co/Ni) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Cobalt Nickel (Co/Ni) Sputtering Target

Grade / formula: Co/Ni

Made to Order

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Overview

Cobalt Nickel (Co/Ni) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Cobalt Nickel (Co/Ni)
Formula / designation Co/Ni
Form Sputtering Target
Purity options
  • 99.5%
  • 99.9%
  • 99.95%
  • 99.99%
View all 5 options
  • ≥99%
Shape options
  • Discs, Plates, Column Targets, Tube Targets
  • Discs
Dimensions Round sputtering target: Diameter: <457.2 mm, Thickness: >1.016 mm Rectangular sputtering target: Length: <914.4 mm, Width: <304.8 mm, Thickness: >1.016 mm
Bonding options Indium

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Display thin-film research

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Request a product-specific SDS

Please request the SDS for your specific material and configuration.

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Tell us what you need

Cobalt Nickel (Co/Ni) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.