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Basis Materials representative image of Cobalt Oxide Sputtering Targets

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Cobalt Oxide Sputtering Targets

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Overview

Cobalt Oxide Sputtering Targets is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Cobalt Oxide
Form Sputtering Target
Deposition method (reference) DC-R, RF-R
Bonding options
  • Indium
  • Indium, Elastomer
Purity options
  • 99.5%
  • 99.9%
  • 99.95%
  • ≥99%
Size options
  • 50.8 mm Dia x 3.175 mm Thick
  • 76.2 mm Dia x 3.175 mm Thick
CAS number 1307-96-6
Shape options Discs
Diameter 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm
Thickness 6.35 mm, 3.175 mm

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Display thin-film research
  • Optical coatings
  • Photovoltaic thin films

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Request a product-specific SDS

Please request the SDS for your specific material and configuration.

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Tell us what you need

Cobalt Oxide Sputtering Targets is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.