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Representative image of CoCrFeNi High Entropy Alloy Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

CoCrFeNi High Entropy Alloy Sputtering Target

Grade / formula: CoCrFeNi

Made to Order

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Overview

CoCrFeNi High Entropy Alloy Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material CoCrFeNi High Entropy Alloy
Formula / designation CoCrFeNi
Form Sputtering Target
Shape options Rectangular
Purity options Co+Cr+Fe+Ni: ≥99%

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Protective coating development

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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High-Entropy Alloy Design Guide & Calculator — compare nominal compositions, mixing entropy, atomic size mismatch and VEC before requesting a material review.

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

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Tell us what you need

CoCrFeNi High Entropy Alloy Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.