Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
CoCrFeNi High Entropy Alloy Sputtering Target
Grade / formula: CoCrFeNi
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
CoCrFeNi High Entropy Alloy Sputtering Target is a source material for physical vapor deposition by sputtering. This is a multi-principal-element alloy system; its phase behavior depends on the specified composition and processing route. Common areas of inquiry include multi-principal-element materials research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | High-Entropy Alloy (HEA/MPEA) |
|---|---|
| Material / Grade | CoCrFeNi |
| Constituent elements | Co, Cr, Fe, and Ni |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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