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BASIS MATERIALS / TARGET
Copper Aluminum Oxide (CuAlO2) Sputtering Target
Grade / formula: CuAlO2
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Technical Specifications
| Material | Copper Aluminum Oxide (CuAlO2) |
|---|---|
| Formula / designation | CuAlO2 |
| Form | Sputtering Target |
| CAS number | 12250-93-0 |
| Purity options | ≥99% |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Bonding options | Indium, Elastomer |
| Molar mass (formula reference) | 122.526 g/mol |
| Density (reference) | ≈6.0 g/cm³ |
| Melting point (reference) | ≈1230°C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Display thin-film research
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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