Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Copper Gallium (Cu/Ga) Sputtering Target
Grade / formula: Cu/Ga
Made to Order
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Copper Gallium (Cu/Ga) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Cu/Ga identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Metal Alloy |
|---|---|
| Material / Grade | Cu/Ga |
| Constituent elements | Cu and Ga |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Copper Gallium (Cu/Ga) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.