Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Gallium Telluride (Ga2Te3) Sputtering Target
Grade / formula: Ga2Te3
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Gallium Telluride (Ga2Te3) Sputtering Target is a source material for physical vapor deposition by sputtering. The Ga2Te3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | Ga2Te3 |
| Constituent elements | Ga and Te |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Gallium Telluride (Ga2Te3) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.