Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Indium Gallium Zinc Oxide (IGZO) Sputtering Target
Grade / formula: IGZO
Made to Order
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Technical Specifications
| Material | Indium Gallium Zinc Oxide (IGZO) |
|---|---|
| Formula / designation | IGZO |
| Form | Sputtering Target |
| Purity options | |
| Relative density | > 90% |
| Deposition method (reference) | RF, DC |
| Backing plate options | Copper (Cu), oxygen free copper, 1/203.2 mm thickness |
| CAS number | 151248-91-8 |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Bonding options | Indium |
| Melting point (reference) | 850°C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Display thin-film research
- Photovoltaic thin films
- Transparent conductive coatings
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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Please request the SDS for your specific material and configuration.
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Indium Gallium Zinc Oxide (IGZO) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.