Skip to content
Basis Materials representative image of Indium Molybdenum Oxide (In2O3/Mo) 98/2 wt% Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Indium Molybdenum Oxide (In2O3/Mo) 98/2 wt% Sputtering Target

Grade / formula: In2O3/Mo

Made to Order

Request a quote

Overview

Indium Molybdenum Oxide (In2O3/Mo) 98/2 wt% Sputtering Target is offered for thin-film deposition research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Technical specifications
Material Indium Molybdenum Oxide (In2O3/Mo) 98/2 wt%
Formula / designation In2O3/Mo
Form Sputtering Target
Purity options 99.9%
Size options
  • 50.8 mm Dia. x 3.175 mm Thick
  • 76.2 mm Dia. x 3.175 mm Thick

Chemical Composition

Nominal composition (wt%)
ComponentNominal composition (wt%)
In2O398
Mo2

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Indium Molybdenum Oxide (In2O3/Mo) 98/2 wt% Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.