Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Iron Gallium Sputtering Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
For sputtered thin-film work, Iron Gallium Sputtering Target provides the named material in target form. The Iron Gallium identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.
Technical specifications
| Material family | Metal Alloy |
|---|---|
| Constituent elements | Fe and Ga |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
Tell us what you need
Iron Gallium Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.