Skip to content
BASIS Materials Purity & Precision sales@basismaterials.com
REQUEST A QUOTE
Basis Materials representative image of Iron Manganese (Fe/Mn) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Iron Manganese (Fe/Mn) Sputtering Target

Grade / formula: Fe/Mn

Made to Order

Request a quote

Overview

Iron Manganese (Fe/Mn) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Iron Manganese (Fe/Mn)
Formula / designation Fe/Mn
Form Sputtering Target
Purity options
  • 99.95%
  • ≥99%
Size options
  • 50.8 mm Dia. x 3.175 mm Thick
  • 50.8 mm Dia. x 6.35 mm Thick
  • 76.2 mm Dia. x 3.175 mm Thick
Shape options Discs
Diameter 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm
Thickness 6.35 mm, 3.175 mm
Bonding options Indium, Elastomer

Chemical Composition

Nominal composition (at%)
ElementNominal composition (at%)
Fe50
Mn50

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Display thin-film research
  • Photovoltaic thin films

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Iron Manganese (Fe/Mn) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.