Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Lanthanum Fluoride (LaF3) Sputtering Target
Grade / formula: LaF3
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Lanthanum Fluoride (LaF3) Sputtering Target is a source material for physical vapor deposition by sputtering. The LaF3 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | LaF3 |
| Constituent elements | La and F |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
Tell us what you need
Lanthanum Fluoride (LaF3) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.