Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Lanthanum Oxide (La2O3) Sputtering Target
Grade / formula: La2O3
Made to Order
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Technical Specifications
| Material | Lanthanum Oxide (La2O3) |
|---|---|
| Formula / designation | La2O3 |
| Form | Sputtering Target |
| CAS number | 1312-81-8 |
| Purity options | ≥99% |
| Shape options | Discs |
| Diameter | 50.8 mm, 76.2 mm, 101.6 mm, 127 mm, 152.4 mm |
| Thickness | 6.35 mm, 3.175 mm |
| Deposition method (reference) | RF, RF-R, DC |
| Bonding options | Indium, Elastomer |
| Molar mass (formula reference) | 325.817 g/mol |
| Density (reference) | 6.51 g/cm³ |
| Melting point (reference) | 2315°C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Optical coatings
- Protective coating development
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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