Skip to content
BASIS Materials Purity & Precision sales@basismaterials.com
REQUEST A QUOTE
Representative image of Lithium Fluoride (LiF) Sputtering Target, bonded to a six-hole copper mounting backplate

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Lithium Fluoride (LiF) Sputtering Target

Grade / formula: LiF

Made to Order

Request a quote

Overview

Lithium Fluoride (LiF) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Lithium Fluoride (LiF)
Formula / designation LiF
Form Sputtering Target
CAS number 7789-24-4
Purity options
  • 99.9% Standard, Higher purity available upon request
  • ≥99%
Shape options
  • Discs, Rectangle, Step, Plates, Sheets, Rods
  • Discs
Deposition method (reference) RF, RF-R, DC
Bonding options Indium, Elastomer
Molar mass (formula reference) 25.938 g/mol
Density (reference) 2.64 g/cm³

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Optical coatings
  • Protective coating development

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Lithium Fluoride (LiF) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.