Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Magnesium Silicide (Mg2Si) Sputtering Target
Grade / formula: Mg2Si
Made to Order
Request a quoteOverview
Technical Specifications
| Material | Magnesium Silicide (Mg2Si) |
|---|---|
| Formula / designation | Mg2Si |
| Form | Sputtering Target |
| Purity options | |
| Size options |
View all 6 options |
| CAS number | 22831-39-6 |
| Shape options | Discs |
| Deposition method (reference) | RF, RF-R, DC |
| Bonding options | Indium, Elastomer |
| Molar mass (formula reference) | 76.695 g/mol |
| Density (reference) | 1.99 g/cm³ |
| Melting point (reference) | 1100°C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Thermal-spray coating development
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
REQUEST A QUOTE
Tell us what you need
Magnesium Silicide (Mg2Si) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.