Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
BASIS MATERIALS / TARGET
Molybdenum Silicide (MoSi2) Sputtering Target
Grade / formula: MoSi2
Made to Order
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Technical Specifications
| Material | Molybdenum Silicide (MoSi2) |
|---|---|
| Formula / designation | MoSi2 |
| Form | Sputtering Target |
| CAS number | 12136-78-6 |
| Purity options | ≥99% |
| Shape options | Discs |
| Deposition method (reference) | RF |
| Bonding options | Indium, Elastomer |
| Molar mass (formula reference) | 152.12 g/mol |
| Density (reference) | 6.24 g/cm³ |
| Melting point (reference) | 2030°C |
Final specifications, available configurations, pricing, and lead time are confirmed during quotation.
Applications
- Semiconductor thin-film research
- Photovoltaic thin films
Customization & RFQ
Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.
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