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Representative image of Nickel Cobalt Vanadium Planar Sputtering Target (NiCoV)

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Nickel Cobalt Vanadium Planar Sputtering Target (NiCoV)

Grade / formula: NiCoV

Made to Order

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Overview

Nickel Cobalt Vanadium Planar Sputtering Target (NiCoV) is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Technical specifications
Material Nickel Cobalt Vanadium Planar Sputtering Target (NiCoV)
Formula / designation NiCoV
Form Sputtering Target
Target configuration Planar
Shape options Rectangular
Purity options Ni+Co+V: ≥99%

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Optical coatings

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Request a product-specific SDS

Please request the SDS for your specific material and configuration.

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Tell us what you need

Nickel Cobalt Vanadium Planar Sputtering Target (NiCoV) is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.