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Nickel Oxide (NiO) Sputtering Target
Grade / formula: NiO
Made to Order
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Nickel Oxide (NiO) Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The NiO identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Ceramic / Compound |
|---|---|
| Material / Grade | NiO |
| Constituent elements | Ni and O |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
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Nickel Oxide (NiO) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.