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Basis Materials representative image of Praseodymium Fluoride Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Praseodymium Fluoride Sputtering Target

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Specifications and availability are confirmed during quotation.

Praseodymium Fluoride Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Praseodymium Fluoride identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.

Technical specifications

Material familyCeramic / Compound
Constituent elementsPr and F
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Praseodymium Fluoride Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.