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Basis Materials representative image of Praseodymium (Pr) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Praseodymium (Pr) Sputtering Target

Grade / formula: Pr

Made to Order

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Overview

Praseodymium (Pr) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Technical specifications
Material Praseodymium (Pr)
Chemical symbol Pr
Form Sputtering Target
Deposition method (reference) DC
CAS number 7440-10-0
Purity options 99.9%
Standard atomic weight (reference) 140.91 ± 0.01
Density (reference) 6.77 g/cm³
Melting point (reference) 931 °C
Thermal conductivity (reference) 13 W/m.K

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Optical coatings
  • Magnetic thin-film studies

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Please request the SDS for your specific material and configuration.

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Tell us what you need

Praseodymium (Pr) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.