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Representative image of Rotatory Molybdenum (Mo) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Rotatory Molybdenum (Mo) Sputtering Target

Grade / formula: Mo

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Overview

Molybdenum is a refractory metal used where thermal stability matters. Rotatory Molybdenum (Mo) Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Rotatory Molybdenum (Mo)
Chemical symbol Mo
Form Sputtering Target
Target configuration Rotary
CAS number 7439-98-7
Purity options
  • ≥99%
  • 99.95%
Shape options Rotatory
Deposition method (reference) DC
Bonding options Indium, Elastomer
Standard atomic weight (reference) 95.95 ± 0.01
Density (reference) 10.2 g/cm³
Melting point (reference) 2622 °C

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research
  • Photovoltaic thin films

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

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Please request the SDS for your specific material and configuration.

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Tell us what you need

Rotatory Molybdenum (Mo) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.