Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Rotatory Titanium (Ti) Sputtering Target
Grade / formula: Ti
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Rotatory Titanium (Ti) Sputtering Target is a source material for physical vapor deposition by sputtering. Titanium is a lightweight metal known for corrosion resistance. Common areas of inquiry include functional coatings and materials research. Planar geometry and mounting requirements depend on the deposition system. Basis Materials can discuss custom dimensions, purity requirements and bonding options during quotation, with the final configuration confirmed for the project.
Technical specifications
| Material family | Pure Element |
|---|---|
| Material / Grade | Ti |
| Element | Ti |
| Constituent elements | Ti |
| Form | Sputtering Target |
| Shape | Tubular |
| Custom options available | true |
| Target configuration | Rotary |
| Availability | Made to Order |
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
Tell us what you need
Rotatory Titanium (Ti) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.