Skip to content
BASIS Materials Purity & Precision sales@basismaterials.com
REQUEST A QUOTE
Basis Materials representative image of Silicon Carbide Planar Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Silicon Carbide Planar Sputtering Target

Made to Order

Request a quote

Overview

Silicon Carbide Planar Sputtering Target is offered for semiconductor thin-film research. Specify the target configuration and dimensions required by your deposition system.

Technical Specifications

Material Silicon Carbide
Form Sputtering Target
Target configuration Planar
Deposition method (reference) RF
Bonding options Indium, Elastomer
Purity options
  • 99.5%
  • ≥99%
Size options
  • 25.4 mm Dia. x 3.175 mm Thick
  • 25.4 mm Dia. x 6.35 mm Thick
  • 50.8 mm Dia. x 3.175 mm Thick
  • 50.8 mm Dia. x 6.35 mm Thick
View all 12 options
  • 76.2 mm Dia. x 3.175 mm Thick
  • 76.2 mm Dia. x 6.35 mm Thick
  • 101.6 mm Dia. x 3.175 mm Thick
  • 101.6 mm Dia. x 6.35 mm Thick
  • 25.4 mm Dia x 3.175 mm Thick
  • 50.8 mm Dia x 3.175 mm Thick
  • 76.2 mm Dia x 3.175 mm Thick
  • 101.6 mm Dia x 3.175 mm Thick
CAS number 409-21-2
Shape options Discs

Final specifications, available configurations, pricing, and lead time are confirmed during quotation.

Applications

  • Semiconductor thin-film research

Customization & RFQ

Requested purity, geometry, dimensions, composition where applicable, and backing / bonding configuration.

Request a Quote

Request a product-specific SDS

Please request the SDS for your specific material and configuration.

Request SDS
REQUEST A QUOTE

Tell us what you need

Silicon Carbide Planar Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.

For made-to-drawing assemblies, include the drawing number and revision in your notes and email the drawing to sales@basismaterials.com. Assembly suitability and the bonding method are reviewed for your material and equipment.