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Basis Materials representative image of Silicon Hexaboride (SiB6) Sputtering Target

Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.

BASIS MATERIALS / TARGET

Silicon Hexaboride (SiB6) Sputtering Target

Grade / formula: SiB6

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Specifications and availability are confirmed during quotation.

For sputtered thin-film work, Silicon Hexaboride (SiB6) Sputtering Target provides the named material in target form. The SiB6 identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. The target outline, thickness and mounting arrangement are confirmed for the cathode. Ask Basis Materials about the required dimensions, purity and bonding arrangement; the finished target specification is established during quotation.

Technical specifications

Material familyCeramic / Compound
Material / GradeSiB6
Constituent elementsSi and B
FormSputtering Target
Custom options availabletrue
AvailabilityMade to Order

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Silicon Hexaboride (SiB6) Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.