Representative image. Actual appearance may vary with composition, dimensions and manufacturing process.
Silicon Nickel Sputtering Target
Made to Order
Request a quoteSpecifications and availability are confirmed during quotation.
Silicon Nickel Sputtering Target brings the specified material system into a sputtering source for thin-film deposition. The Silicon Nickel identity helps define the film chemistry under a specified deposition process. Film chemistry and process compatibility should be reviewed for the intended coating. Source geometry and installation details are reviewed for the intended sputtering equipment. Size, purity and any backing or bonding requirement can be reviewed with Basis Materials before a target configuration is quoted.
Technical specifications
| Material family | Metal Alloy |
|---|---|
| Constituent elements | Si and Ni |
| Form | Sputtering Target |
| Custom options available | true |
| Availability | Made to Order |
Request a product-specific SDS
Please request the SDS for your specific material and configuration.
Tell us what you need
Silicon Nickel Sputtering Target is included automatically. Tell us the form, size and quantity you need; other details are optional.